Vacuum Processing Apparatus Shared Exhaust and Power Base
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Solution Overview
Problem
Vacuum processing apparatuses with dual chamber systems experience variations in processing results between processing regions due to differences in exhaust units, power input, and drive units, leading to machine differences.
Innovation Solution
The design includes two identical dual-chamber vacuum processing units with synchronized high-frequency power sources, matching boxes, and a shared drive base, along with a single exhaust unit positioned equally distant from both chambers, to minimize machine differences and ensure consistent processing across regions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If separate exhaust systems are used for each processing chamber, then each chamber can be independently controlled, but machine differences occur between processing regions
Solution Approach 1:
The patent merges the exhaust systems of multiple processing chambers into a single shared exhaust unit. The exhaust outlets of the first and second processing chambers are both connected to the same exhaust unit, which is positioned at a location equidistant from both chambers. This consolidation eliminates machine differences caused by separate exhaust systems while maintaining independent chamber control through separate gas distribution assemblies.
2Reliability
If separate power sources are used for each chamber, then power control is independent, but variations in processing results occur due to power input differences
Solution Approach 1:
The patent combines power input components by mounting both the first and second high-frequency power sources, along with their respective matching boxes, on a single shared drive base. This configuration ensures identical power input conditions for both processing chambers, eliminating variations in processing results while maintaining the ability to independently control each chamber through separate RF power sources.
Solution Approach 2:
The patent creates equipotential conditions for power input by positioning both power sources and matching boxes on the same drive base structure. This ensures that both processing chambers receive power under identical electrical and physical conditions, eliminating machine differences caused by unequal power input configurations.
3Reliability
If chambers are positioned at different locations, then spatial isolation is achieved, but exhaust unit positioning causes machine differences
Solution Approach 1:
The patent positions the shared exhaust unit at a specific asymmetric location that is equidistant from both processing chambers. This careful positioning compensates for the asymmetric spatial arrangement of the chambers, ensuring that both chambers experience identical exhaust conditions despite their different locations, thereby eliminating machine differences.
4Productivity
If dual chamber system is implemented, then throughput is increased, but machine difference between processing regions is recognized
Solution Approach 1:
The patent merges previously separate systems (exhaust, power sources, matching boxes) into shared common infrastructure for the dual chamber system. By consolidating these components while maintaining separate gas distribution and independent chamber control, the patent achieves high throughput through parallel processing while eliminating machine differences between the two processing regions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration reduces variations in processing results between chambers, enhances reproducibility, and allows for a more compact apparatus with improved plasma stability and reduced footprint.
Implementation Method 1
a first high-frequency power source supplying first high-frequency power having a first high frequency to the first lower electrode, and a second high-frequency power source supplying second high-frequency power having a second high frequency which is higher than the first high frequency to the first lower electrode
Implementation Method 2
a first vacuum processing chamber having a first exhaust outlet
Data Source
AI summary
A vacuum processing apparatus includes a vacuum processing chamber, an upper electrode, a lower electrode, a first high-frequency power source, a second high-frequency power source, a first matching box, a second matching box, a copper plate for connecting an electrode shaft of the lower electrode with the second matching box, a drive base on which the electrode shaft of the lower electrode and the second matching box are mounted, a drive unit for ascending or descending the drive base, and an exhaust unit disposed at a position equally distanced from an exhaust outlet by a distance.