Vacuum Pump Product Removal Using Sensor-Guided Etch Control
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Solution Overview
Problem
Existing vacuum pump systems face issues with product deposition that interferes with normal rotation, and the use of gases like hydrogen halide, fluorine, chlorine trifluoride, and fluorine radicals for removal can lead to corrosion of the base material if not controlled properly.
Innovation Solution
A product removal apparatus with sensors to measure temperature, film thickness, or vibration frequency, and a control device to regulate the supply of gases based on these measurements to prevent over-etching and ensure complete product removal.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If hydrogen halide, fluorine, chlorine, chlorine trifluoride, or fluorine radicals are supplied to the vacuum pump to remove deposited products, then product removal efficiency is improved, but corrosion of the base material occurs due to over-etching
Solution Approach 1:
The patent implements a feedback control system where a sensor continuously monitors parameters (temperature, film thickness, or vibration frequency) inside the vacuum pump, and a control device adjusts the gas supply accordingly. When the sensor detects that products have been sufficiently removed or that the base material is at risk of corrosion, the control device automatically stops or reduces gas supply, preventing over-etching while maintaining high product removal efficiency
Solution Approach 2:
The patent dynamically changes the parameters of gas supply (flow rate, concentration, duration) based on real-time sensor measurements. The control device adjusts these parameters to optimize the etching process, ensuring sufficient product removal while preventing excessive exposure that would cause base material corrosion
2Productivity
If too much hydrogen halide, fluorine, chlorine, chlorine trifluoride, or fluorine radical is supplied to the vacuum pump, then product removal is enhanced, but the base material of the vacuum pump is corroded by over-etching
Solution Approach 1:
The feedback control system monitors removal progress through sensor measurements and automatically terminates gas supply when products are sufficiently removed, preventing further exposure that would reduce vacuum pump reliability and service life
Solution Approach 2:
The patent applies just enough gas to achieve complete product removal without excessive exposure. The control device precisely regulates gas supply duration and quantity to match the actual amount of product present, avoiding unnecessary corrosion that would compromise vacuum pump reliability
3Object-affected harmful factors
If too little hydrogen halide, fluorine, chlorine, chlorine trifluoride, or fluorine radical is supplied to the vacuum pump, then corrosion of the base material is suppressed, but products deposited in the vacuum pump are not sufficiently removed
Solution Approach 1:
The sensor continuously monitors product presence through temperature, film thickness, or vibration frequency measurements. The control device maintains gas supply as long as products are detected, ensuring complete removal while preventing gas supply when products are gone, thus avoiding unnecessary corrosion
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively removes deposited products while minimizing corrosion of the vacuum pump components by controlling gas supply based on measured parameters, ensuring efficient operation and extended component lifespan.
Implementation Method 1
a sensor for measuring the temperature of the inside of a vacuum pump, the thickness of a film of a product in a flow path in the vacuum pump, or the vibration frequency of the vacuum pump
Implementation Method 2
a sensor for measuring the temperature of the inside of a vacuum pump, the thickness of a film of a product in a flow path in the vacuum pump, or the vibration frequency of the vacuum pump
Implementation Method 3
react the products deposited inside the vacuum pump and the like included in the exhaust equipment with the gas containing at least one substance selected from the group consisting of hydrogen halide, fluorine, chlorine, chlorine trifluoride, and fluorine radicals, thereby removing the products
Data Source
AI summary
The present disclosure provides a product removal apparatus, a treatment system, and a product removal method that can sufficiently remove the products deposited inside a vacuum pump and also suppress corrosion of the base material of the vacuum pump. The product removal apparatus of the present disclosure includes: a sensor for measuring the temperature of the inside of a vacuum pump, the thickness of a film of a product in a flow path in the vacuum pump, or the vibration frequency of the vacuum pump; a gas supplier for supplying a gas containing hydrogen halide, fluorine, chlorine, chlorine trifluoride, or fluorine radicals to the vacuum pump; and a control device. The control device controls the gas supplier so that the supply of the gas to the vacuum pump is stopped depending on a rate of temperature increase calculated from the temperature measured by the sensor, the film thickness, or the vibration frequency.