Vacuum Pump Electrodes for Radical Cleaning of Deposits
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Solution Overview
Problem
Existing vacuum pumps face issues with deposition buildup due to gas solidification, leading to reduced exhaustion capacity, contamination of the process chamber, and increased maintenance frequency, as radicals supplied from the inlet port lose activity before reaching the outlet port and fail to effectively clean the entire pump.
Innovation Solution
A vacuum pump design with electrodes generating radicals within the casing, evenly distributed to cover the entire gas passage, using high-frequency voltage to decompose depositions into low molecular weight gases, and a purge gas system to enhance decomposition and exhaustion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If radicals are supplied from the inlet port toward the center, then decomposition of depositions near the inlet can be achieved, but radicals lose activity before reaching the outlet port and depositions in the outlet vicinity cannot be effectively cleaned
Solution Approach 1:
The radical supply function is segmented into multiple locations: radicals are supplied not only from the inlet port but also directly at the outlet port and at multiple positions along the gas passage. This segmentation ensures that depositions are cleaned at each segment of the passage, preventing the loss of radical effectiveness over distance.
Solution Approach 2:
The radical supply approach transitions from a single-dimensional (inlet-only) supply method to a multi-dimensional supply system. Radicals are introduced at multiple spatial dimensions including the inlet port, outlet port, and intermediate positions along the gas passage, creating comprehensive coverage throughout the entire pump interior.
2Device complexity
If a radical supply device is installed at the inlet port, then the structure is simple, but radicals cannot be supplied evenly throughout the entire gas passage
Solution Approach 1:
The radical supply system is divided into multiple independent supply points distributed along the gas passage. Each supply point can be controlled separately, allowing uniform radical distribution throughout the passage without requiring a complex centralized system.
Solution Approach 2:
Multiple components within the pump serve dual functions: the inlet port, outlet port, and intermediate structures all serve as radical supply locations. This multi-functionality allows uniform deposition cleaning without adding dedicated complex radical supply infrastructure.
3Reliability
If multiple nozzles are installed circumferentially to clean the entire pump, then deposition cleaning coverage is improved, but device complexity and cost increase
Solution Approach 1:
Existing structural components of the pump (inlet port, outlet port, intermediate walls) are utilized as radical supply locations. This approach achieves comprehensive cleaning coverage without adding multiple dedicated nozzles, thereby maintaining device simplicity while improving cleaning effectiveness.
Solution Approach 2:
The pump's own structural components serve the additional function of radical supply. The inlet port, outlet port, and intermediate structures naturally become radical introduction points, eliminating the need for separate complex radical supply infrastructure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effective decomposition and exhaustion of depositions, reducing maintenance cycles and improving production efficiency by ensuring radicals contact and decompose depositions throughout the pump, maintaining high vacuum conditions.
Implementation Method 1
at least a pair of electrodes that generate radicals are disposed in the casing
Implementation Method 2
decompose depositions adsorbed on the stator-blade blade, an inner surface of the casing and the like
Implementation Method 3
the rotor blade is driven at a high speed of several hundred m/second, for example, so that a process gas entering from an inlet port side and used for the processing is compressed inside the pump and is exhausted from an outlet port side
Implementation Method 4
a molecule of the process gas having been taken in through the inlet port side of the vacuum pump hits a stator-blade blade by movement toward the outlet port side by a rotor-blade blade and is adsorbed by the stator-blade blade
Implementation Method 5
using high-frequency voltage to decompose depositions into low molecular weight gases, and a purge gas system to enhance decomposition and exhaustion
Data Source
AI summary
A vacuum pump which can decompose depositions by radicals and effectively exhaust them is provided. The vacuum pump including a casing, a stator disposed on an inner side of the casing, and a shaft rotatably supported with respect to the stator and also including a cylindrical rotor rotatably enclosed together with the shaft in the casing, in which an electrode portion, which is a part of a radical generating device that generates radicals, is disposed in the casing.