Vacuum Stage Tilt Control for Parallel Substrate Processing
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Solution Overview
Problem
Existing vacuum processing apparatuses face challenges in maintaining the parallelism between the stage and the top wall of the processing container, leading to tilting issues due to deformation caused by pressure and temperature changes, which affects the uniformity of substrate processing.
Innovation Solution
The apparatus incorporates a tilt changer mechanism, supported by a rotator and actuators, along with a distance meter system to measure and adjust the tilt of the stage relative to the top wall, ensuring parallel alignment through a controller that adjusts the position of the base member and stage using a parallel link mechanism, while an absorption mechanism absorbs deformation stress.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the stage is fixed rigidly to the bottom wall, then the structure is simple and stable, but the stage cannot be adjusted for tilt caused by deformation
Solution Approach 1:
The patent transforms the rigid fixed connection into a dynamic adjustable connection. The tilt changer mechanism allows the stage to be adjusted in real-time to compensate for deformation, changing the system from static to dynamic and enabling continuous adaptation to maintain parallelism.
Solution Approach 2:
The patent implements a feedback control system where the distance meter continuously measures the gap between the stage and top wall, and the controller uses this information to automatically adjust the tilt changer, creating a closed-loop feedback mechanism that maintains optimal parallelism.
2Measurement precision
If the distance meter measures at multiple positions, then the tilt detection precision is improved, but the measurement time and system complexity increase
Solution Approach 1:
The patent uses three measurement positions, which is more than the minimum one position needed, providing sufficient precision without the excessive complexity of full surface mapping. This partial measurement approach achieves adequate tilt detection accuracy efficiently.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively suppresses the tilt of the stage with respect to the top wall, enhancing the in-plane uniformity of substrate processing by maintaining the stage and top wall parallel, thereby improving the uniformity of gas and RF power distribution.
Implementation Method 1
a distance meter 9 configured to measure a distance between the top wall and the stage at a measurement position on a surface of the top wall facing the stage
Data Source
AI summary
A vacuum processing apparatus includes: a processing container having top and bottom walls, a sidewall, and an interior that is kept in a vacuum atmosphere; a stage provided inside the processing container to hold a substrate placed on the stage so as to face the top wall; a support member penetrating the bottom wall to support the stage from below; a tilt changer provided at an end portion of the support member located outside the processing container to change a tilt of the stage relative to the top wall; at least one distance meter configured to measure a distance between the top wall and the stage at a measurement position on a surface of the top wall facing the stage; and a controller that controls the tilt changer to make the top wall and the stage parallel to each other based on the distance between the top wall and the stage.