Vacuum Substrate Carrier for Irregular Lithography

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Solution Overview

Problem

Conventional lithographic apparatuses are inadequate for handling non-standard sized and shaped substrates, as they often require modification or new equipment, and existing solutions like substrate carriers involve bonding which complicates repositioning and increases contamination risks.

Innovation Solution

A substrate carrier that uses a vacuum to securely hold substrates of varying sizes and shapes, allowing for easy repositioning and processing without bonding, featuring a sealed space with a dense array of burls and apertures for efficient vacuum establishment and maintenance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If conventional lithographic apparatus are used with non-standard substrates, then the apparatus requires modification or new equipment, but this increases device complexity and cost

Engineering Contradiction:
Improvesubstrate compatibilityVSAvoidapparatus modification
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

A substrate carrier is introduced as an intermediary component between the standard lithographic apparatus and non-standard substrates. The carrier has a standardized interface that fits the existing apparatus, while providing a customized surface to accommodate various substrate shapes and sizes. This mediator allows the apparatus to handle diverse substrates without requiring modification of the apparatus itself.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If bonding methods are used to secure substrates to carriers, then substrates are held firmly in position, but this complicates repositioning and increases contamination risks

Engineering Contradiction:
Improvesubstrate positioningVSAvoidcontamination risk
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The bonding method is replaced with a mechanical vacuum clamping system. The substrate carrier incorporates a vacuum chamber that creates a sealed environment around the substrate, using pressure differential to hold the substrate securely in position. This mechanical system allows for easy release and repositioning by simply adjusting the vacuum pressure, without requiring chemical bonding agents that could cause contamination.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Ease of operation

If vacuum is used to hold substrates on the carrier, then repositioning is simplified and contamination reduced, but vacuum integrity must be maintained for precise positioning

Engineering Contradiction:
Improvesubstrate repositioningVSAvoidpositioning accuracy
Core Design Contradiction:
Ease of operationVSManufacturing precision

Solution Approach 1:

The substrate carrier incorporates a flexible sealing mechanism that maintains vacuum integrity while allowing for substrate repositioning. The seal can adapt to slight movements and adjustments of the substrate, ensuring that vacuum pressure is maintained throughout the repositioning process. This flexible sealing prevents air leaks that would compromise positioning accuracy, while still enabling easy substrate manipulation.

Inventive Principle:
Principle #30Flexible shells and thin films

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables the secure and efficient processing of irregularly shaped substrates within existing lithographic apparatuses, reducing the risk of contamination and simplifying handling, while maintaining vacuum integrity for precise positioning and pattern application.

Implementation Method 1

A substrate carrier arranged to hold a substrate in position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate

Methodology Applied
Scientific EffectVacuum: Vacuum

Data Source

PatentUS7675606B2Lithographic apparatus and method
Publication Date: 2010.03.09 ASML NETHERLANDS BV
  • US7675606B2 patent drawing
  • US7675606B2 patent drawing
  • US7675606B2 patent drawing

AI summary

According to one of the aspects of the present invention there is provided a substrate carrier arranged to hold a substrate in position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate.