Vacuum Substrate Surface Cleaning With Ionic Liquid Manipulation
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Solution Overview
Problem
Existing methods for processing substrate surfaces, particularly in vacuum environments, are limited by low flexibility in tool selection, require separate handling steps, and struggle with efficient removal of particles and defects, especially in microelectronics where defects on photomasks and EUV masks are prevalent, leading to imaging defects and system impairment.
Innovation Solution
A device with a fluid applicator and manipulator for controlled application and movement of fluids in a vacuum environment, allowing targeted and efficient removal of particles and defects on substrates, using ionic liquids and other fluids with low vapor pressure to facilitate processing in situ and under low ambient pressure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If fluid-based processing methods are used in vacuum environments, then cleaning efficiency and particle removal capability are improved, but device complexity increases due to the need for specialized vacuum-compatible fluid handling systems
Solution Approach 1:
The device is divided into separate functional modules: a fluid applicator for applying cleaning fluid to the substrate surface, a manipulator for precise positioning, and a positioner for vacuum-compatible movement. This segmentation allows each component to be optimized for vacuum operation while maintaining overall cleaning efficiency.
Solution Approach 2:
Traditional mechanical contact-based cleaning methods are replaced with fluid-based processing. The fluid applicator delivers cleaning fluid to the substrate surface, and the manipulator uses controlled fluid flow rather than direct mechanical contact to remove particles, reducing wear and contamination while maintaining effectiveness in vacuum.
2Reliability
If ionic liquids are used for particle removal, then particle removal effectiveness is improved, but loss of substance increases due to the specialized nature of ionic liquids
Solution Approach 1:
The system is designed to recover and reuse ionic liquids after the cleaning process. The manipulator and positioner work together to collect excess fluid and particles, allowing the ionic liquid to be regenerated and reused multiple times, thereby reducing material loss while maintaining high particle removal effectiveness.
3Ease of operation
If automated fluid applicators and manipulators are used, then ease of operation is improved, but device complexity increases due to the integration of multiple positioning and control systems
Solution Approach 1:
The manipulator and positioner are designed as multi-functional components that can perform multiple operations: positioning the fluid applicator, controlling fluid delivery, and managing particle removal. This universality reduces the need for separate specialized components, simplifying operation while maintaining the automated fluid-based processing capabilities.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient, automated, and controlled processing of substrate surfaces, including cleaning and defect removal, with enhanced safety and reduced risk of surface damage, utilizing fluid-based methods that exploit synergies between steps and leverage the properties of ionic liquids for improved particle removal.
Implementation Method 1
using ionic liquids and other fluids with low vapor pressure to facilitate processing in situ and under low ambient pressure
Implementation Method 2
A device with a fluid applicator and manipulator for controlled application and movement of fluids in a vacuum environment
Data Source
AI summary
The present application relates to a device, to a method and to a computer program comprising instructions for processing of a surface of a substrate in a vacuum environment. The device includes: a fluid applicator set up to apply a fluid to a region of the surface; a manipulator set up to move the fluid and/or a particle influenced by the fluid at least to some degree on the surface of the substrate; and a positioner for relative positioning of the fluid applicator and/or of the manipulator with respect to the surface.