Vacuum Transfer Valves for Contamination Isolation
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Solution Overview
Problem
Conventional vacuum processing apparatuses lack optimization of wafer processing efficiencies and productivity, leading to reduced reliability and reproducibility due to inadequate consideration of contamination prevention between vacuum transfer and processing chambers.
Innovation Solution
The apparatus incorporates first and second vacuum transfer vessels, intermediate chamber vessels, and a lock chamber, with strategically placed valves for controlled communication and isolation between these components to prevent contamination and enhance processing efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple vacuum chambers are coupled to improve productivity, then wafer processing efficiency is improved, but contamination between chambers increases
Solution Approach 1:
The vacuum system is divided into multiple independently controllable vacuum chambers (first vacuum chamber, second vacuum chamber, third vacuum chamber) that can be isolated from each other using valve mechanisms. This allows simultaneous operation of multiple chambers without cross-contamination, enabling improved productivity while maintaining chamber isolation.
Solution Approach 2:
A transfer chamber serves as an intermediary space between the first and second vacuum chambers. The transfer chamber is equipped with separate valve mechanisms that control communication with each vacuum chamber independently. This intermediary structure allows wafers to be transferred between chambers while preventing direct atmospheric contamination and enabling independent pressure control of each chamber.
2Object-affected harmful factors
If valves are added to prevent contamination between chambers, then contamination is reduced, but device complexity increases
Solution Approach 1:
The transfer chamber is designed with multi-functional valve mechanisms that can simultaneously control communication with multiple vacuum chambers. Each valve mechanism serves multiple purposes: isolating chambers, enabling wafer transfer, and maintaining pressure differentials. This universal design reduces the need for separate specialized components for each function.
Solution Approach 2:
The valve mechanisms are integrated into the chamber structure itself, allowing the chambers to self-regulate their isolation and communication states. The system includes control means that automatically manage valve operations based on operational requirements, reducing the need for external complex control systems.
3Productivity
If transfer chambers are made larger to accommodate multiple chambers, then wafer transfer capability is improved, but chamber dimension requirements increase
Solution Approach 1:
The transfer chamber is segmented into distinct regions with separate valve access points to different vacuum chambers. This segmentation allows the transfer chamber to efficiently handle wafer transfers to multiple chambers without requiring a single large open space, optimizing volume utilization while maintaining transfer capability.
Data Source
AI summary
The vacuum processing apparatus is comprised of two vacuum transfer vessels in which a wafer is transferred through; two vacuum process vessels connected to these vacuum transfer vessels respectively; an intermediate chamber vessel capable of storing thereinto the wafer connected between the vacuum transfer vessels; a lock chamber connected to one of the vacuum transfer vessels; and a plurality of valves disposed among the vacuum transfer vessels, the vacuum process vessels, the intermediate chamber vessel, and the lock chamber respectively, for airtightly opening/closing communications among these vessels and the chamber; in which any one of the valves disposed on both sides of the intermediate chamber vessel is closed before the valves disposed between processing chambers of the vacuum process vessels and vacuum transfer chambers of the vacuum transfer vessels is opened.