Vacuum Regulating Valve Layout for Symmetrical Low-Pressure Flow
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Solution Overview
Problem
Vacuum regulating valves in semiconductor manufacturing face challenges in achieving precise and homogeneous fluid distribution and flow regulation, particularly at low pressures, due to inhomogeneous flow curves and mechanical connections that disrupt symmetry, leading to turbulence and particle generation.
Innovation Solution
A vacuum machining system with a vacuum regulating valve that divides the vacuum chamber into a main and secondary chamber, using multiple valve sub-openings arranged symmetrically around a central axis, with each sub-opening having a respective valve seat and sealing surface, allowing for independent movement of valve plates to achieve symmetrical and laminar flow, and quick actuation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a single large valve opening is used for flow regulation, then the total flow area is sufficient, but the flow distribution becomes inhomogeneous and turbulence increases
Solution Approach 1:
The single large valve opening is divided into multiple smaller sub-openings (e.g., 4-16 openings) arranged in a grid pattern. Each sub-opening is controlled by its own valve plate, allowing independent regulation. This segmentation creates homogeneous flow distribution while maintaining sufficient total flow area, eliminating turbulence caused by large single openings.
2Stability of the object's composition
If mechanical connections are used in the valve center for guidance, then the valve structure is stable, but symmetry is disrupted causing turbulence
Solution Approach 1:
The mechanical guidance connection is completely removed from the valve center. Instead of using a central mechanical guide that disrupts flow symmetry, the valve plates are guided by magnetic fields generated by coil assemblies positioned at the periphery. This extraction of the mechanical connection eliminates the source of flow asymmetry and turbulence while maintaining valve stability through magnetic guidance.
3Ease of operation
If conventional valve actuation is used, then the valve can be operated, but movement time is too long affecting productivity
Solution Approach 1:
Conventional mechanical actuation systems are replaced with electromagnetic actuation. Coil assemblies generate magnetic fields that directly act on the valve plates, enabling rapid and precise movement. This substitution of mechanical actuation with electromagnetic actuation significantly reduces valve movement time while maintaining ease of operation through electrical control.
4Productivity
If valve plates are moved quickly to reduce actuation time, then productivity improves, but particle generation increases
Solution Approach 1:
Mechanical actuation systems that cause friction and particle generation are replaced with electromagnetic actuation. The magnetic fields move the valve plates without physical contact, enabling rapid actuation without the friction-induced particle generation associated with mechanical systems. This allows fast valve operation while maintaining a particle-free environment.
Data Source
AI summary
Vacuum machining system (1), comprising a vacuum chamber (10) and a vacuum regulating valve (20). The vacuum valve (20) has a first valve seat (21a), which has a first valve opening (22a) defining a first opening axis (O) and a first sealing surface extending around the first valve opening (O), and a first valve plate (23a) with a first contact surface corresponding to the first sealing surface. The vacuum machining system further comprises a drive unit (30), which is designed in such a way and is coupled to the first valve plate (23a) in such a way that the latter can be moved at least from an open position to a closed position and back again. The first valve seat (21a) arranged within the vacuum chamber (10) and divides the vacuum chamber (10) into a main process chamber (11) for machining the substrate and into a secondary process chamber (12). The first sealing surface extends orthogonally to the first opening axis (O) and points in the direction of the secondary process chamber (12). The first valve plate (23a) is movably arranged in the secondary process chamber (12).