Valve Block Integration in Substrate Processing Shower Heads
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Solution Overview
Problem
Existing substrate processing apparatuses face limitations in minimizing gas supply time due to delays caused by the distance between chambers, leading to increased overall processing time and difficulties in controlling deposition thickness in atomic layer deposition (ALD) processes.
Innovation Solution
The substrate processing apparatus incorporates a valve block part installed on the upper portion of the shower head, which controls the flow of process gases. This configuration minimizes the distance between the valve and the shower head inlet, allowing for immediate and stable gas supply, and includes features like a heater and temperature measuring member to maintain process gas temperature and prevent gas reactions before reaching the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of time
If the valve is installed far from the shower head in the gas line, then it is easier to install and maintain the valve, but the gas supply time increases due to the distance delay
Solution Approach 1:
The valve block is integrated into the shower head structure, with the valve nested within the shower head assembly. This allows the valve to be positioned immediately adjacent to the shower head inlet, minimizing gas supply distance and time, while the integrated design maintains ease of operation through standardized mounting interfaces
Solution Approach 2:
The valve block is positioned in a different spatial arrangement relative to the shower head, moving from a distant linear gas line configuration to an integrated position at the shower head inlet. This dimensional repositioning reduces the gas path length significantly while maintaining accessibility for operation and maintenance
2Loss of time
If the gas supply distance is reduced by placing the valve closer to the shower head, then gas supply time is minimized, but the device complexity increases
Solution Approach 1:
The valve and shower head are merged into a single integrated valve block assembly. The valve block includes the valve body, gas inlet, and shower head components combined in one structure, eliminating the need for separate valve housing and reducing overall device complexity despite the reduced gas supply distance
Solution Approach 2:
The valve block serves multiple functions: it houses the valve mechanism for gas control, provides the shower head structure for gas distribution, and includes heating elements for temperature control. This multi-functionality reduces the need for separate components, thereby reducing device complexity while achieving rapid gas supply
3Productivity
If the process gas is supplied quickly to improve productivity, then deposition thickness control in ALD process becomes more difficult
Solution Approach 1:
The valve enables periodic gas supply cycles with precise timing control. Gas is supplied in controlled pulses through the valve block, allowing rapid yet precise delivery of process gas to the substrate. This periodic action maintains high productivity through fast cycle times while ensuring precise deposition thickness control through regulated gas exposure duration
Solution Approach 2:
The integrated valve block system allows for precise control of gas supply timing and duration, enabling feedback-based control of the deposition process. By controlling the valve operation timing and gas flow duration, the system can adjust deposition thickness precisely while maintaining high productivity through optimized gas supply cycles
4Loss of time
If the valve block is integrated with the shower head to minimize gas supply distance, then gas supply time is reduced, but the manufacturing complexity increases
Solution Approach 1:
The valve block is designed as a segmented modular assembly with standardized components that can be manufactured separately and assembled. The valve body, shower head sections, and heating elements are designed as discrete modules that can be produced using standard manufacturing processes and then integrated, reducing overall manufacturing complexity despite the integrated design
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables instantaneous gas supply and precise control over deposition thickness, stabilizing the ALD process and improving productivity by reducing processing time and minimizing contamination from gas reactions.
Implementation Method 1
The valve block part may further include a heater configured to heat the valve block
Implementation Method 2
The valve block part may further include a temperature measuring member configured to measure a temperature of the valve block
Implementation Method 3
the valve block part may include: a plurality of valves to which a plurality of gas lines, through which the plurality of gases are supplied, are connected, respectively
Implementation Method 4
A substrate processing apparatus is an apparatus that deposits reactive particles contained in a process gas onto a substrate using a chemical vapor deposition (CVD) method or an atomic layer deposition (ALD) method
Implementation Method 5
A substrate processing apparatus is an apparatus that deposits reactive particles contained in a process gas onto a substrate using a chemical vapor deposition (CVD) method or an atomic layer deposition (ALD) method
Data Source
AI summary
The present disclosure relates to a substrate processing apparatus that controls supply of a process gas through a valve block. The substrate processing apparatus includes a substrate support on which a substrate is supported, a shower head part provided to face the substrate support and configured to inject a process gas toward the substrate, and a gas supply part configured to supply the process gas to the shower head part. The gas supply part includes a valve block part installed on an upper portion of the shower head part to adjust a flow of the process gas.