Valve Controller Closed Position Shifter for Film Growth Exhaust
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Solution Overview
Problem
The availability of film growth apparatuses is reduced due to residue buildup from reaction byproducts in the exhaust system, particularly when controlling multiple reactors with unified exhaust systems to increase throughput, leading to operational difficulties and increased maintenance needs.
Innovation Solution
A film growth apparatus and method that includes a valve controller to store and adjust the closed position of the valving element, detect load shifts, and initiate cleaning when the load exceeds a threshold, ensuring continuous operation and reducing the frequency of valve cleaning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple reactors are controlled to have the same condition with unified exhaust system, then throughput is increased, but residue buildup in valve increases
Solution Approach 1:
The system continuously monitors the load on the valving element driver and uses this feedback to detect residue buildup. When the load exceeds a predetermined reference value, the system automatically shifts the closed position of the valving element to compensate for the residue, maintaining proper pressure control without requiring manual intervention or shutdown.
Solution Approach 2:
The valve controller automatically detects and compensates for residue buildup by shifting the closed position based on load monitoring. This self-adjusting mechanism eliminates the need for frequent manual cleaning and maintenance, allowing the system to service itself and maintain high availability even with unified exhaust processing of multiple wafers.
2Reliability
If valve cleaning is performed frequently to remove residue, then availability is improved, but maintenance time increases
Solution Approach 1:
The system performs preliminary detection of residue buildup by monitoring the load on the valving element driver before it causes operational problems. By detecting load changes in advance and automatically adjusting the closed position, the system prevents the need for frequent cleaning operations, reducing maintenance time while maintaining high availability.
3Manufacturing precision
If valving element position is adjusted to compensate for residue, then pressure control is maintained, but valve operation complexity increases
Solution Approach 1:
The system replaces complex manual valve adjustment mechanisms with an automated electronic control system. The valve controller monitors load electronically and automatically adjusts the closed position of the valving element based on detected changes, maintaining precise pressure control without requiring complex mechanical adjustment mechanisms or manual intervention.
Data Source
AI summary
A film growth apparatus according to one aspect of the present disclosure includes: a reactor configured to perform film growth processing on a substrate; an exhaust configured to discharge an exhaust gas from the reactor to the outside; a first valve including a valving element, the first valve provided in a pipe connecting the reactor with the exhaust and configured to control a pressure of the reactor by a position of the valving element; a valving element driver configured to cause the valving element to operate; and a valve controller including a closed position storage configured to store a closed position of the valving element, an opening degree controller configured to control the position of the valving element operated by the valving element driver, and a closed position shifter configured to detect a load of the valving element driver and shift the closed position in a case where the load exceeds a predetermined reference value.