Valve Cv Stabilization via Closed-Loop Gas Supply Control

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Solution Overview

Problem

In semiconductor device manufacturing, the frequent opening and closing of valves in gas supply lines for CVD and ALD processes lead to fluctuations in Cv values due to wear, causing inconsistent film formation results, particularly in ALD where the valve frequency is high.

Innovation Solution

A gas supply apparatus with a detector to monitor a correlated index, such as pressure, and an adjustment mechanism to control the valve opening degree, ensuring the index remains within an appropriate range corresponding to the desired Cv value, thereby stabilizing the gas supply and film formation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If the valve is repeatedly opened/closed to perform gas supply and interruption, then the gas supply control is improved, but the Cv value changes due to wear causing gas supply amount fluctuation

Engineering Contradiction:
Improvegas supply controlVSAvoidgas supply amount stability
Core Design Contradiction:
Ease of operationVSReliability

Solution Approach 1:

The system continuously monitors the actual gas supply amount and compares it with the target value, then automatically adjusts the valve opening degree to compensate for Cv value changes. This closed-loop feedback mechanism eliminates the need for manual intervention while maintaining stable gas supply despite valve wear.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system dynamically changes the valve opening degree parameter based on detected Cv value variations. By adjusting this parameter in real-time, the system compensates for valve wear and maintains consistent gas supply performance without requiring valve replacement or manual recalibration.

Inventive Principle:
Principle #35Parameter changes

2Reliability

If the valve opening degree is adjusted frequently to compensate for Cv value changes, then the gas supply amount stability is improved, but the valve wear accelerates

Engineering Contradiction:
Improvegas supply amount stabilityVSAvoidvalve service life
Core Design Contradiction:
ReliabilityVSDuration of action of stationary object

Solution Approach 1:

The system transitions from static valve positioning to dynamic adjustment, where the valve opening degree is continuously optimized based on real-time feedback. This allows the system to achieve stable gas supply with minimal adjustment frequency, extending valve service life while maintaining performance.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The system performs preliminary detection of Cv value changes and makes proactive adjustments before significant performance degradation occurs. This preventive approach reduces the frequency of corrective adjustments and extends valve operational life.

Inventive Principle:
Principle #10Preliminary action

3Manufacturing precision

If a correction recipe is executed to calculate the Cv value, then the film formation result consistency is improved, but the processing time increases

Engineering Contradiction:
Improvefilm formation result consistencyVSAvoidprocessing time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The system performs continuous monitoring and adjustment of gas supply parameters during normal operation, eliminating the need for separate correction recipes. This integrates the quality control function into the continuous production process, maintaining film consistency without interrupting or extending processing time.

Inventive Principle:
Principle #20Continuity of useful action

Solution Approach 2:

The system automatically detects Cv value changes and adjusts valve positioning without requiring external intervention or separate calibration procedures. This self-regulating capability maintains manufacturing precision while eliminating time-consuming correction recipes.

Inventive Principle:
Principle #25Self-service

Data Source

PatentUS12024776B2Gas supply apparatus, gas supply method, and substrate processing apparatus
Publication Date: 2024.07.02 TOKYO ELECTRON LTD
  • US12024776B2 patent drawing
  • US12024776B2 patent drawing
  • US12024776B2 patent drawing

AI summary

A gas supply apparatus supplies a gas to a processing space where a gas processing is performed on a substrate. The gas supply apparatus includes: a gas supply source configured to supply a gas; a gas supply path configured to supply the gas to the processing space; an opening/closing valve configured to supply/stop the gas and provided in the gas supply path; a detector configured to detect a detectable index correlated with a Cv value of the opening/closing valve; an opening degree adjustment mechanism configured to adjust an opening degree of the opening/closing valve when the opening/closing valve is opened; and a controller configured to: store a relationship between the Cv value and the index; and control the opening degree by the opening degree adjustment mechanism such that when the index deviates from an appropriate range corresponding to an appropriate Cv value, the index falls within the appropriate range.