Constant Pressure Valve Diaphragm Collision Prevention
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Solution Overview
Problem
Conventional constant pressure valves used in semiconductor fabrication processes generate particles during repeated opening and closing cycles, leading to substrate contamination and process failures due to collisions between the valve body and diaphragm.
Innovation Solution
An apparatus and method featuring a substrate treatment system with a constant pressure valve and a shut-off valve, where the controller ensures the diaphragm remains non-contact with the body by applying different pressures before and after liquid discharge, preventing collisions and particle production.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the constant pressure valve is used to adjust liquid supply pressure by opening and closing the fluid passage, then the liquid supply amount can be controlled, but particles are generated due to collision between the body and diaphragm
Solution Approach 1:
The controller closes the shut-off valve before closing the constant pressure valve, preparing the system state in advance to prevent liquid pressure from forcing the diaphragm against the body during valve closure, thereby preventing particle generation
Solution Approach 2:
The shut-off valve acts as an intermediary component between the liquid supply line and the constant pressure valve. By closing the shut-off valve first, it isolates the liquid pressure source, allowing the constant pressure valve to close without the diaphragm being forced against the body by high liquid pressure
2Ease of operation
If the diaphragm is moved by liquid pressure to open or close the fluid passage, then the liquid supply can be controlled, but repeated collision produces large amounts of particles
Solution Approach 1:
The shut-off valve serves as a mediator that is controlled by the controller to close before the constant pressure valve. This intermediary action removes the harmful liquid pressure effect that causes diaphragm collision, while preserving the automatic control function of the constant pressure valve
Solution Approach 2:
The controller implements a feedback control sequence where it monitors the state of liquid discharge and accordingly controls the shut-off valve and constant pressure valve in a specific sequence (shut-off valve first, then constant pressure valve), preventing particle generation while maintaining automatic operation
3Productivity
If multiple sheets of substrates are treated with repeated discharge and stop of liquid, then substrate processing is completed, but collision between body and diaphragm is repeated producing particles
Solution Approach 1:
Before each liquid discharge operation, the controller ensures the shut-off valve is closed first, preparing the system to prevent particle generation. This preliminary action is repeated for each substrate processing cycle, maintaining substrate cleanliness while enabling continuous high-volume processing
Solution Approach 2:
The shut-off valve acts as a protective intermediary that is closed before each liquid discharge cycle. This prevents diaphragm collision and particle generation during repeated substrate processing operations, ensuring substrate cleanliness is maintained throughout high-volume production
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents particle generation during liquid supply and stop operations, reducing contamination and ensuring process reliability by maintaining the diaphragm in a non-contact position with the valve body, thereby enhancing substrate cleanliness and process efficiency.
Implementation Method 1
a fluid supply member to apply fluid pressure or air pressure to move the diaphragm
Implementation Method 2
an elastic member to support the pressurizing shaft to apply elastic force in a vertical direction
Data Source
AI summary
Provided are an apparatus and a method for supplying a liquid. An apparatus for treating a substrate includes a substrate support unit to support the substrate, and a liquid supplying unit to supply a liquid to a substrate supported by the substrate support unit. The liquid supplying unit includes a nozzle to discharge the liquid, a liquid supplying line to supply the liquid to the nozzle, a constant pressure valve installed on the liquid supplying line, a shut-off valve installed on the liquid supplying line while being interposed between the constant pressure valve and the nozzle to supply the liquid or to stop the supply of the liquid, and a controller to control the constant pressure valve and the shut-off valve.