Vanadium Nitride Film Composition for Hard Wear-Resistant Coatings
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Solution Overview
Problem
Conventional vanadium nitride films have limited hardness and require specialized film formation apparatus for complex shapes, increasing costs and posing challenges in improving abrasion resistance.
Innovation Solution
A vanadium nitride film with a vanadium to nitrogen ratio of 1.08 or more and a chlorine concentration between 1% and 5% is formed using the plasma chemical vapor deposition method, enhancing hardness and allowing for the use of standard film formation apparatus.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If the vanadium nitride film hardness is increased to improve abrasion resistance, then the Vickers hardness improves, but the film formation cost increases due to requiring specialized apparatus
Solution Approach 1:
The invention changes the chemical composition parameters of the vanadium nitride film, specifically controlling the vanadium to nitrogen ratio to be 1.08 or more and chlorine concentration to be 1-5 at%, which enables achieving Vickers hardness of 2400 or more using standard plasma CVD apparatus without requiring specialized equipment
Solution Approach 2:
The invention replaces expensive specialized film formation apparatus with standard plasma chemical vapor deposition equipment, reducing capital investment and operational costs while maintaining high film hardness through optimized composition control
2Strength
If the vanadium nitride film hardness is increased to improve abrasion resistance, then the Vickers hardness improves, but the manufacturing cost increases due to specialized apparatus requirements
Solution Approach 1:
The invention optimizes the chemical composition parameters (V/N ratio ≥1.08, chlorine concentration 1-5 at%) to achieve high hardness films using cost-effective standard plasma CVD equipment, eliminating the need for expensive specialized apparatus and reducing overall manufacturing costs
Solution Approach 2:
The invention makes standard plasma chemical vapor deposition apparatus capable of producing high-hardness vanadium nitride films, allowing the same equipment to serve multiple purposes including complex shape articles without additional specialized equipment
3Manufacturing precision
If conventional ion plating method is used to form vanadium nitride film, then the film can be formed, but the throwing power is poor requiring rotation mechanism for complex shapes
Solution Approach 1:
The invention replaces the mechanical rotation system required in ion plating with a chemical vapor deposition process that provides inherent excellent throwing power, allowing uniform film formation on complex shapes without mechanical rotation mechanisms
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves a Vickers hardness of 2400 or more and a complex elastic modulus of 400 GPa or less, improving abrasion resistance and reducing the need for specialized equipment.
Implementation Method 1
it has been completely unclear whether the plasma chemical vapor deposition method can improve the hardness of the vanadium nitride film
Data Source
AI summary
In a vanadium nitride film formed on a surface of a base material, a ratio V [at %]/N [at %] between a vanadium element concentration and a nitrogen element concentration in the film is 1.08 or more and a chlorine element concentration in the film is 1 at % or more and 5 at % or less.