Vanadium Nitride Coating Composition for Harder Complex-Shape Films
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional vanadium nitride films have limited hardness and require specialized film formation apparatus for complex shapes, increasing costs, while the plasma chemical vapor deposition method's effectiveness for improving hardness is unknown.
Innovation Solution
A vanadium nitride film with a vanadium to nitrogen ratio of 1.08 or more and a chlorine concentration between 1% and 5% is formed using the plasma chemical vapor deposition method, utilizing a plasma processing apparatus with specific gas supply and pressure conditions to enhance hardness and reduce apparatus costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If the conventional ion plating method is used to form a vanadium nitride film, then the film can be formed on the base material, but the film hardness is limited to about HV 2300
Solution Approach 1:
The invention changes the composition parameters of the vanadium nitride film by controlling the vanadium to nitrogen ratio to be 1.08 or more and chlorine concentration to be 1-5 at%, which results in improved film hardness exceeding HV 2400 and enhanced abrasion resistance
Solution Approach 2:
The invention creates a composite vanadium nitride film containing vanadium, nitrogen, and chlorine elements in specific ratios, where the chlorine content of 1-5 at% contributes to forming a harder and more abrasion-resistant coating structure
2Adaptability or versatility
If the ion plating method is used for coating complicated shape articles, then a rotation mechanism is required at the work table, but this increases the cost and complexity of the film formation apparatus
Solution Approach 1:
The invention replaces the mechanical rotation system with a plasma chemical vapor deposition process that utilizes plasma flow and chemical reactions to achieve uniform coating on complex shapes without requiring work table rotation or specialized apparatus
Solution Approach 2:
The invention uses plasma as an intermediary medium to deliver vanadium and nitrogen species to the base material surface, enabling conformal coating of complex geometries without mechanical movement of the substrate
3Ease of manufacture
If the plasma chemical vapor deposition method is used to form a vanadium nitride film, then the apparatus cost is reduced and throwing power is improved, but the film hardness was previously unknown and uncertain
Solution Approach 1:
The invention establishes specific parameter ranges for plasma chemical vapor deposition, including vanadium to nitrogen ratio of 1.08 or more and chlorine concentration of 1-5 at%, which guarantee film hardness exceeding HV 2400 when using this lower-cost deposition method
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves a vanadium nitride film with improved hardness exceeding 2400 HV and reduced complex elastic modulus, offering superior abrasion resistance and cost-effective production for complex shapes without the need for specialized film formation equipment.
Implementation Method 1
a method for manufacturing a member coated with a vanadium nitride film by a plasma chemical vapor deposition method
Implementation Method 2
plasma chemical vapor deposition method
Data Source
AI summary
In a vanadium nitride film formed on a surface of a base material, a ratio V [at %]/N [at %] between a vanadium element concentration and a nitrogen element concentration in the film is 1.08 or more and a chlorine element concentration in the film is 1 at % or more and 5 at % or less.