Vapor Deposition Apparatus Gap Retaining Roller
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Solution Overview
Problem
Existing vapor deposition apparatuses struggle to maintain a constant gap between the film formation substrate and the vapor deposition mask, leading to misalignment and blurring of the deposited pattern, especially on large-sized substrates, due to factors like thermal expansion and self-weight deflection, which results in low precision and increased costs.
Innovation Solution
A vapor deposition apparatus with a gap retaining member that protrudes and rotates during scanning, maintaining a constant gap between the vapor deposition mask and the film formation substrate, ensuring precise alignment and pattern accuracy by preventing contact and controlling the gap effectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If the vapor deposition mask is moved relative to the film formation substrate during vapor deposition, then large-sized substrates can be processed, but the gap between the mask and substrate becomes unstable due to thermal expansion and self-weight deflection
Solution Approach 1:
The patent replaces the mechanical ball screw positioning system with a magnetic field-based positioning system. Magnets are embedded in the mask holder to generate magnetic forces that attract and hold the vapor deposition mask at a precise, stable position relative to the substrate, eliminating mechanical errors from thermal expansion and deflection
Solution Approach 2:
The patent changes the physical state or properties of the positioning mechanism by introducing magnetic fields. The magnetic force parameter is used to maintain a constant gap distance, compensating for thermal expansion and self-weight deflection effects that would otherwise cause position drift
2Device complexity
If a mechanical positioning system like ball screw is used to move the vapor deposition source and mask, then the apparatus structure becomes complex, but maintaining a constant gap is difficult due to thermal expansion and deflection
Solution Approach 1:
The patent replaces the mechanical ball screw positioning system with a magnetic field-based positioning system. Magnets are embedded in the mask holder to generate magnetic forces that attract and hold the vapor deposition mask at a precise, stable position relative to the substrate, eliminating mechanical errors from thermal expansion and deflection
Solution Approach 2:
The patent introduces magnetic fields as an intermediary force between the mask holder and the substrate. This magnetic field acts as a mediator to maintain the gap distance without direct mechanical contact, avoiding the reliability issues of mechanical systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves high-precision pattern formation over large substrates by maintaining a consistent gap, reducing pattern fluctuations and misalignment, thereby improving productivity and reducing costs by simplifying the mechanism and lowering the unit price.
Implementation Method 1
a gap retaining member which protrudes toward the other member, rotates, during scanning, in a scanning direction while in contact with the member it faces
Implementation Method 2
a vapor deposition source for ejecting vapor deposition particles; a vapor deposition mask which has openings and causes the vapor deposition particles ejected from the vapor deposition source to be vapor-deposited on the film formation substrate through the openings
Data Source
AI summary
A vapor deposition apparatus (50) includes: a mask unit (54) including a vapor deposition source (70), a vapor deposition mask (60), and a mask holding member (80); a substrate holder (52); and at least either a mask unit moving mechanism (55) or a substrate moving mechanism (53), with a roller (83) provided in a surface of one of (A) the substrate holder (52) and (B) the mask holding member (80) which faces the other one of (A) the substrate holder (52) and (B) the mask holding member (80).