Vapor Sensor Leak Detection in Millisecond Anneal Systems
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Solution Overview
Problem
Millisecond anneal systems face challenges in detecting fluid leaks within the processing chamber, which can contaminate the clean process gas ambient and lead to errors in semiconductor substrate processing, as existing leak detection methods are not suitable for the hostile environment and cannot detect leaks in real-time.
Innovation Solution
A thermal processing system equipped with a gas flow system and a vapor sensor, such as a humidity sensor, to measure vapor in the process gas flowing through the system, allowing for the detection of fluid leaks in the processing chamber by comparing humidity levels to a threshold, providing real-time leak indication.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If existing leak detection methods are used, then the system structure remains simple, but fluid leaks cannot be detected until maintenance inspections
Solution Approach 1:
A vapor sensor is introduced as an intermediary component to detect fluid leaks by measuring vapor concentration in the process gas. The sensor acts as a mediator between the fluid cooling system and the control system, enabling indirect detection of leaks without requiring direct contact with cooling fluids or complex inspection procedures.
Solution Approach 2:
The patent replaces mechanical leak detection methods (such as pressure testing or visual inspection during maintenance) with a vapor sensing system that uses optical or electrical fields to detect vapor concentration. This substitution enables continuous, non-contact detection and eliminates the need for system shutdowns or physical disassembly.
2Productivity
If fluid leaks are not detected, then the system operates continuously without interruption, but substrate processing errors occur due to contamination
Solution Approach 1:
The vapor sensor provides continuous feedback on fluid leak conditions by monitoring vapor concentration in the process gas. When vapor concentration exceeds a threshold indicating a leak, the system can immediately respond by shutting down or adjusting operations, preventing contamination of substrates while minimizing interruption to continuous processing.
Solution Approach 2:
The system performs preliminary detection of fluid leaks before they can contaminate substrates. By continuously monitoring vapor concentration and detecting leaks early, the system takes preventive action to stop processing before contamination occurs, thereby maintaining manufacturing precision while allowing continuous operation overall.
3Reliability
If maintenance inspections are performed frequently, then leak detection reliability improves, but system downtime increases
Solution Approach 1:
The vapor sensing system enables continuous leak detection during normal operation, eliminating the need for periodic maintenance shutdowns. The sensor operates continuously alongside substrate processing, providing uninterrupted monitoring without requiring system停机 or disassembly, thus maintaining both reliability and productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables immediate detection of fluid leaks within the processing chamber, preventing contamination and ensuring the quality of semiconductor substrate processing by providing real-time alerts and reducing the risk of processing errors due to undetected leaks.
Implementation Method 1
A thermal processing system can be equipped with a gas flow system and a vapor sensor, such as a humidity sensor, to measure vapor in the process gas flowing through the system
Data Source
AI summary
Systems and methods for detecting a fluid leak associated with fluid cooled components in a millisecond anneal system are provided. In one example implementation, a millisecond anneal system can include a processing chamber having one or more fluid cooled components. The system can include a gas flow system configured to provide for the flow of process gas in the processing chamber. The system can include a vapor sensor configured to measure vapor in process gas flowing through the gas flow system for detecting a fluid leak associated with the one or more fluid cooled components.