Liquid Source Vaporization Control for Stable Pressure Without Venting
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Solution Overview
Problem
Existing semiconductor manufacturing processes face challenges in maintaining reproducible source gas supply with consistent flow rate and pressure, leading to waste of high-cost liquid source due to inefficient vaporization and venting during ON and OFF periods.
Innovation Solution
A liquid source vaporization apparatus equipped with a control valve, pressure sensor, and flow rate sensor, controlled by a valve controller to maintain the flow rate at or below the vaporization limit and ensure pressure consistency, eliminating the need for a vent line and reducing waste.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If the control valve is kept ON during OFF periods to maintain pressure, then pressure stability is improved, but liquid source waste increases
Solution Approach 1:
The system performs preliminary vaporization of the liquid source during the ON period, creating a reservoir of source gas in the line. This allows the control valve to be closed during the OFF period while maintaining sufficient source gas supply to the chamber, preventing liquid source waste while ensuring pressure stability.
Solution Approach 2:
The vaporization process continues to provide useful source gas to the chamber during the OFF period through the already-vaporized gas in the line, eliminating the need to keep the control valve open and thus preventing liquid source waste while maintaining continuous film formation.
2Manufacturing precision
If the control valve is switched ON prior to the ON period to ensure constant flow rate, then flow rate consistency is improved, but source gas waste increases
Solution Approach 1:
The control valve is opened in advance before the ON period to allow the source gas flow rate to stabilize to the target value. This preliminary action ensures that when the ON period begins, the flow rate is already consistent and stable, eliminating the need for additional waste during the actual deposition period.
Solution Approach 2:
The system uses flow rate sensors and control algorithms to monitor and adjust the source gas flow rate in real-time. This feedback mechanism ensures that the flow rate reaches and maintains the target value efficiently, minimizing waste while achieving the required flow rate consistency for high-quality film formation.
3Object-affected harmful factors
If a vent line is used to discard source gas during OFF periods, then chamber contamination is prevented, but liquid source waste increases
Solution Approach 1:
The source gas that would normally be vented during the OFF period is instead utilized to continue forming the film on the substrate. This continuous useful action eliminates the need for a vent line and the associated liquid source waste, while maintaining film quality and preventing chamber contamination.
Solution Approach 2:
Instead of discarding the source gas through a vent line during the OFF period, the system recovers and utilizes this gas for continued film formation. This recovery approach eliminates waste while maintaining the benefits of pulsed deposition, preventing chamber contamination and reducing liquid source consumption.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves precise control over source gas flow rate and pressure, minimizing waste and ensuring efficient vaporization, thereby reducing the amount of discarded source gas.
Implementation Method 1
a liquid source vaporization apparatus that vaporizes a liquid source by mixing the liquid source with a carrier gas
Data Source
AI summary
There is provided a control valve that is provided on a flow path along which flows a source fluid which is a liquid source or a source gas obtained by vaporizing a liquid source, a pressure sensor that is provided on a downstream side of the control valve, a flow rate sensor that measures a flow rate of the source fluid, and a valve controller that, while reducing a deviation between a set pressure and a measured pressure measured by the pressure sensor, controls the control valve such that a measured flow rate measured by the flow rate sensor is equal to or less than a limit flow rate which is a flow rate that is set based on an upper limit flow rate at which the liquid source can still be vaporized.