Liquid Material Vaporization Device Pressure-Based Flow Control
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Solution Overview
Problem
Conventional liquid material vaporization and supply devices require calibration specific to the type of material gas, leading to inaccurate flow rate control when calibration data is unavailable, and are limited by low heat resistance and slow response speed of flow rate controllers.
Innovation Solution
A liquid material vaporization and supply device that uses a pressure sensor to control the flow rate of material gas through a fluid control valve, eliminating the need for type-specific calibration, and includes a flow rate control part that calculates and adjusts the flow rate based on pressure reductions, enabling accurate control regardless of gas type and improving response speed and heat resistance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a flow rate controller with flow rate sensor is used to control material gas flow rate, then the flow rate can be controlled, but calibration must be performed for each material gas type which is time-consuming and complex
Solution Approach 1:
The invention extracts the flow rate sensing function from the conventional flow rate controller and implements it separately using a pressure sensor that measures pressure changes in the constant pressure tank. This separation eliminates the need for calibration of flow rate sensors for different gas types, as pressure sensing does not require gas-specific calibration data.
Solution Approach 2:
The invention replaces the mechanical/electronic flow rate sensor system with a pressure-based control system. By using a pressure sensor to detect pressure changes and a fluid control valve to regulate flow based on these pressure changes, the system substitutes the complex flow rate sensing mechanism with a simpler pressure measurement approach that avoids calibration requirements.
2Measurement precision
If a flow rate controller is used to control material gas flow rate, then flow rate control is achieved, but the response speed is slow
Solution Approach 1:
The invention implements a feedback control system where the pressure sensor continuously monitors the pressure in the constant pressure tank and feeds this information back to the fluid control valve. The valve adjusts its opening based on the pressure feedback to maintain constant pressure, creating a rapid closed-loop control system that responds quickly to pressure changes without the latency of conventional flow rate controllers.
3Measurement precision
If a conventional flow rate controller is used, then flow rate control is possible, but heat resistance is low limiting the maximum heating temperature
Solution Approach 1:
The invention extracts the flow control function from the heat-sensitive flow rate controller and implements it using heat-resistant components: a pressure sensor and fluid control valve that can withstand high temperatures. This allows the vaporization tank to be heated to higher temperatures without damaging the control components, as the flow control is now performed downstream by heat-resistant elements.
4Measurement precision
If calibration is performed for each material gas type to achieve accurate flow rate control, then control accuracy is improved, but the device complexity increases
Solution Approach 1:
The invention creates a universal control system using a pressure sensor and fluid control valve that can control the flow rate of any material gas without requiring gas-specific calibration. The pressure-based control mechanism is universally applicable to different gas types, eliminating the need for multiple calibration procedures or gas-specific controller configurations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution allows for accurate flow rate control of material gases without calibration data, increases the maximum flow rate by enhancing heat resistance, and speeds up response times, while reducing errors and noise influences.
Implementation Method 1
a pressure sensor that senses the pressure inside the second tank
Implementation Method 2
a fluid control valve that is provided in the lead-out path to open/close the lead-out path; and a flow rate control part that, when the material gas contained in the second tank at the predetermined pressure is led out through the lead-out path, on the basis of a reduction in the sensed pressure sensed by the pressure sensor, controls the opening level of the fluid control valve to control the flow rate
Implementation Method 3
a first tank in which a liquid material is vaporized to produce material gas
Data Source
AI summary
A liquid material vaporization and supply device is provided in which it is possible to accurately control a flow rate even in the case where calibration data is not available for a material gas. A first tank in which a liquid material is vaporized to produce material gas; a second tank in which the material gas is contained at a predetermined pressure; a pressure sensor that senses the pressure inside the second tank; a lead-out path for leading the material gas out of the second tank; a fluid control valve that is provided to open/close the lead-out path; and a flow rate control part that, when the material gas is led out through the lead-out path, on the basis of a reduction in the pressure sensed by the pressure sensor, controls the opening level of the valve to control the flow rate of the material gas are included.