Dual-Heater Vaporizer Feedback for Stable Semiconductor Gas Supply
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Solution Overview
Problem
The existing vaporization processes in semiconductor manufacturing face instability in gas supply due to temperature fluctuations of the liquid source, leading to fluctuations in vaporization rates, which affects the consistent supply of vaporized gases into the reaction tube.
Innovation Solution
A vaporizer system is designed with a liquid vessel, internal and external heaters, and temperature sensors to control the temperature of the liquid source and the vessel, ensuring stable vaporization by adjusting the heaters based on real-time temperature measurements, thereby maintaining a consistent vaporization rate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If gas supply is started by opening a supply valve, then vaporization amount increases, but temperature of liquid source is lowered by vaporization heat causing vaporization amount to decrease
Solution Approach 1:
The system performs preliminary heating of the liquid source using the first heater before gas supply is started. This preliminary action ensures that when vaporization begins, the liquid source is already at the appropriate temperature, preventing the temperature drop that would otherwise occur due to vaporization heat and maintaining stable vaporization amount throughout the process
Solution Approach 2:
The system uses temperature sensors to continuously monitor the temperature of the liquid source and adjusts the heating power of the first heater based on this feedback. When the supply valve is opened and vaporization increases, the feedback mechanism detects the temperature drop and automatically increases heating power to compensate, maintaining stable vaporization amount
2Reliability
If temperature of liquid source is lowered during gas supply, then vaporization amount decreases, but stable gas supply is required
Solution Approach 1:
The control system continuously monitors the temperature of the liquid source during gas supply and adjusts the heating power of the first heater in real-time based on temperature feedback. This ensures that even when the supply valve is opened and vaporization increases, the temperature is maintained at the appropriate level, ensuring both stable gas supply and consistent vaporization amount
Solution Approach 2:
The system dynamically changes the heating parameter (power of the first heater) in response to changes in gas supply conditions. When the supply valve is opened, the system increases heating power to compensate for the increased vaporization heat demand, maintaining the liquid source temperature and ensuring stable vaporization throughout the gas supply process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration stabilizes the vaporization process, reduces recovery time to a predetermined temperature, and ensures a stable flow rate of vaporized gases, enhancing the reliability and efficiency of semiconductor manufacturing processes.
Implementation Method 1
a first heater capable of heating the liquid source by immersion into the liquid source stored in the liquid vessel
Implementation Method 2
a second heater capable of heating the liquid vessel
Implementation Method 3
a gas (also referred to as a 'vaporized gas') obtained by vaporizing a liquid source by heating a vessel in which the liquid source is stored
Data Source
AI summary
Described herein is a technique capable of stabilizing a supply flow rate of a vaporized gas. According to one aspect of the technique, there is provided a vaporizer including: a liquid vessel in which a liquid source is stored; a first heater capable of heating the liquid source by immersion into the liquid source stored in the liquid vessel; a second heater capable of heating the liquid vessel; a first temperature sensor capable of measuring a temperature of the liquid source by immersion into the liquid source; a second temperature sensor capable of measuring a temperature of the liquid vessel; and a controller capable of controlling the first heater based on the temperature measured by the first temperature sensor and controlling the second heater based on the temperature measured by the second temperature sensor.