Chemical Solution Vaporizing Tank with Pressure Equalization
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Solution Overview
Problem
In semiconductor manufacturing, chemical solution vaporizing tanks for producing processing gases face challenges in maintaining uniform concentrations across multiple processing modules due to differences in operating conditions and pressure losses in piping, leading to variations in vaporization efficiency and processing gas quality, which affects the yield and adhesion of resist patterns on wafers.
Innovation Solution
A chemical solution vaporizing tank with laterally partitioned vaporizing chambers, a chemical solution passage below the liquid level, and a gas passage above the liquid level to equalize pressures, along with a vaporization gas supply unit and processing gas takeout passage, ensures uniform chemical solution distribution and concentration across chambers, reducing the need for multiple tanks and minimizing space requirements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a chemical solution vaporizing tank is shared among multiple processing modules, then the installation space is reduced, but differences in pressure loss in pipes cause differences in chemical solution level between chambers, leading to variations in vaporization efficiency and processing gas concentration
Solution Approach 1:
The vaporizing tank is segmented into multiple independent vaporizing chambers (first, second, third chambers) that are laterally partitioned. Each chamber can independently vaporize chemical solution and supply processing gas to respective processing modules, while sharing the same tank structure. This segmentation allows uniform chemical solution distribution to each chamber while maintaining space efficiency.
Solution Approach 2:
A communication passage is provided that connects the vaporizing chambers at the same level, allowing chemical solution to flow freely between chambers. This equalizes the chemical solution level across all chambers, ensuring that each chamber receives the same amount of chemical solution despite differences in pipe pressure losses to various processing modules.
2Manufacturing precision
If individual vaporizing tanks are provided for each processing module, then the processing gas concentration can be controlled uniformly, but the installation space increases
Solution Approach 1:
Multiple vaporizing tanks are merged into a single shared vaporizing tank structure that contains laterally partitioned vaporizing chambers. The tank body is divided into first, second, and third chambers by partition walls, allowing independent vaporization in each chamber while sharing common structural support and chemical solution supply infrastructure, thereby reducing installation space.
Solution Approach 2:
The shared vaporizing tank serves multiple functions by providing independent vaporization chambers for different processing modules simultaneously. Each chamber can independently control vaporization while the overall structure provides space efficiency, making the system universally applicable to multiple processing requirements.
3Productivity
If chemical solution level differences occur between chambers, then the ratio between chemical solution and gas varies, causing vaporization efficiency to vary and making control impossible
Solution Approach 1:
The communication passage connects vaporizing chambers at the same elevation, creating an equipotential system for chemical solution distribution. This allows gravity-driven equalization of chemical solution levels across all chambers, ensuring uniform solution-to-gas ratios and consistent vaporization efficiency without complex control mechanisms.
Solution Approach 2:
Liquid level sensors are installed in each vaporizing chamber to detect the chemical solution level. When the liquid level in any chamber falls below a predetermined threshold, the sensor triggers automatic replenishment of chemical solution, ensuring continuous uniform vaporization efficiency and maintaining control capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration maintains uniform processing gas concentrations across multiple modules, enhancing processing consistency and reducing the required installation space by allowing individual vaporization processing in each chamber without the need for tanks corresponding to the number of works, thus improving yield and reducing manufacturing costs.
Implementation Method 1
a gas passage located above the liquid level in each of the vaporizing chambers and formed at the partition member to communicate the vaporizing chambers with each other for uniformizing pressures in the respective vaporizing chambers
Implementation Method 2
a vaporization gas supply unit arranged for each of the vaporizing chambers for supplying the vaporization gas to the chemical solution in the vaporizing chamber and producing the processing gas in a space above the liquid level of the chemical solution
Data Source
AI summary
An object is to suppress differences in concentration between processing gases supplied to a plurality of works in a chemical solution vaporizing tank. The chemical solution vaporizing tank includes a tank body having a plurality of vaporizing chambers formed by laterally and airtightly partitioning an internal space of the tank body, a chemical solution passage located under a liquid level in each vaporizing chamber and formed at each partition member for passing the chemical solution between the vaporizing chambers, and a gas passage located above the liquid level in each vaporizing chamber and formed at the partition member to communicate the vaporizing chambers with each other for uniformizing pressures in the respective vaporizing chambers. A quantity of the channel layer in each vaporizing chamber is controlled by managing, e.g., the liquid level.