Vaporizing Unit Cleaning via Dual Solvent System
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Solution Overview
Problem
The deposition of by-products in vaporizing units during the processing of high-permittivity films like HfO2 and ZrO2 leads to clogging, particle formation, and reduced vaporizing performance, necessitating frequent maintenance due to the reactivity of these materials with moisture and heat.
Innovation Solution
A substrate processing system that includes a vaporizing unit, a supply system for vaporized gases, an exhaust system, and a cleaning liquid supply system, which uses at least two types of cleaning liquids to remove deposited products from the vaporizing unit, with an aprotic solvent like hexane followed by a protic solvent like methanol to effectively decompose and dissolve the by-products.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a liquid material is vaporized in a vaporizing unit to supply to a reaction chamber, then the material supply amount is increased, but decomposed matter is deposited in the vaporizing unit causing clogging and particle formation
Solution Approach 1:
The patent applies preliminary action by introducing a cleaning liquid supply system that automatically cleans the vaporizing unit during or after the vaporization process. The cleaning liquid is supplied through a dedicated supply line to prevent decomposed matter from accumulating, thereby maintaining vaporization efficiency without requiring frequent manual maintenance interruptions.
Solution Approach 2:
The system implements self-service by enabling the vaporizing unit to clean itself through the automated cleaning liquid supply mechanism. The cleaning liquid flows through the vaporizing unit to remove decomposed matter automatically, allowing the system to maintain its own performance without external intervention for routine maintenance.
2Object-generated harmful factors
If the vaporizing unit is cleaned frequently to remove deposited materials, then particle formation is prevented, but maintenance time and system downtime increase
Solution Approach 1:
The patent ensures continuity of useful action by implementing a cleaning system that operates during or immediately after the vaporization process without requiring system shutdown. The cleaning liquid supply system maintains continuous operation, allowing the vaporizing unit to be cleaned while the substrate processing system remains operational, thereby eliminating maintenance downtime.
Solution Approach 2:
The system performs preliminary cleaning action by supplying cleaning liquid continuously or periodically to prevent decomposed matter from accumulating to problematic levels. This proactive approach prevents particle formation before it occurs, rather than requiring corrective maintenance after particles are generated.
3Object-generated harmful factors
If cleaning liquid is supplied to the vaporizing unit, then deposited materials are removed, but the system complexity increases
Solution Approach 1:
The cleaning liquid supply system is designed with multi-functionality to reduce overall system complexity. The same cleaning liquid supply mechanism serves multiple purposes: cleaning the vaporizing unit, preventing particle formation, and maintaining material flow pathways. This universal approach consolidates multiple functions into a single integrated system rather than requiring separate systems for each function.
Solution Approach 2:
The cleaning liquid acts as an intermediary substance that facilitates the removal of decomposed matter without requiring direct mechanical intervention. By using the cleaning liquid as a mediator, the system avoids complex mechanical cleaning mechanisms such as brushes, scrapers, or disassemblable components, thereby reducing system complexity while maintaining effective cleaning capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach prevents particle formation, extends the maintenance interval of the vaporizing unit and piping, reduces maintenance costs, and enhances the system's availability by efficiently removing decomposed material deposits.
Implementation Method 1
a first cleaning liquid permeates into the by-product by supplying the first cleaning liquid into the vaporizing unit
Implementation Method 2
a second cleaning liquid reacts with the by-product and decomposes the by-product by supplying the second cleaning liquid into the vaporizing unit
Implementation Method 3
the liquid material passes through a material introducing pipe 22 and is vaporized in a vaporizing chamber 24 heated by a heater 23
Data Source
AI summary
Disclosed is a substrate processing system, including:a processing chamber to process a substrate; a vaporizing unit to vaporize a material of liquid; a supply system to supply the processing chamber with gas of the material vaporized by the vaporizing unit; an exhaust system to exhaust an atmosphere in the processing chamber; and a cleaning liquid supply system to supply the vaporizing unit with cleaning liquid for cleaning a product deposited in the vaporizing unit, wherein the cleaning liquid supply system supplies at least two kinds of cleaning liquids into the vaporizing unit so that the product can be removed from the vaporizing unit by action of the two kinds of cleaning liquids on the product.