Variable Aperture Electrode for Ion Implanter Beam Control

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Solution Overview

Problem

Existing ion implantation systems face limitations in achieving high current ion implantation with variable beam energies due to fixed aperture and gap configurations, which restrict the range of beam energies and focus control.

Innovation Solution

The introduction of a variable aperture electrode (VAE) and variable gap electrode (VGE) system with a pendulum scanning mechanism allows for adjustable apertures and gaps, enabling efficient extraction and control of ion beams across a wider energy range (0.5 to 80 keV) by modulating the electric field and reducing space charge repulsion.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If fixed aperture and gap configurations are used in extraction electrode system, then device complexity is reduced, but beam energy range and focus control are limited

Engineering Contradiction:
Improvebeam energy rangeVSAvoidelectrode system complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent implements variable aperture electrodes (VAE) and variable gap electrodes (VGE) that can dynamically adjust their aperture sizes and gap distances. The VAE includes movable aperture plates that can change the aperture size, while the VGE can adjust the gap distance between electrodes. This dynamic adjustability enables the system to operate across a wide beam energy range (0.5 to 80 keV) while maintaining proper focus control, directly resolving the contradiction between adaptability and device complexity.

Inventive Principle:
Principle #15Dynamics

2Adaptability or versatility

If variable aperture and gap electrodes are introduced, then beam energy range and focus control are improved, but device complexity increases

Engineering Contradiction:
Improvefocus controlVSAvoidelectrode system complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The variable aperture electrodes incorporate movable aperture plates that can be adjusted to change the aperture size, enabling precise focus control for different beam energies. The variable gap electrode system allows dynamic adjustment of the gap distance between electrodes. These dynamic features provide excellent focus control across the full energy range while the modular design keeps the complexity manageable.

Inventive Principle:
Principle #15Dynamics

3Productivity

If fixed extraction electrode system is used, then device complexity is minimized, but space charge repulsion and beam current are limited

Engineering Contradiction:
Improvebeam currentVSAvoidelectrode system complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent utilizes variable aperture and gap parameters to optimize the electric field distribution in the extraction region. By adjusting the aperture size and gap distance, the system can modulate the electric field strength and configuration, thereby reducing space charge repulsion effects and enabling higher beam currents to be extracted efficiently from the ion source.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enhances the ion implantation system's ability to operate at higher beam currents and wider energy ranges, improving beam focus and control, thereby increasing the efficiency and precision of ion implantation processes.

Implementation Method 1

enabling efficient extraction and control of ion beams across a wider energy range (0.5 to 80 keV) by modulating the electric field

Methodology Applied
Scientific EffectElectric field modulation: Electric Field

Implementation Method 2

reducing space charge repulsion

Methodology Applied
Scientific EffectSpace charge repulsion reduction: Ion Repulsion/Attraction

Data Source

PatentUS7915597B2Extraction electrode system for high current ion implanter
Publication Date: 2011.03.29 AXCELIS TECHNOLOGIES INC
  • US7915597B2 patent drawing
  • US7915597B2 patent drawing
  • US7915597B2 patent drawing

AI summary

A system and method extraction electrode system, comprising an extraction electrode, wherein the extraction electrode, further defines an aperture and forms a portion of the outside wall of the ion source and is configured to extract ions from the ion source, a suppression disk half assembly comprising two suppression electrode plate disk halves that form a variable suppression aperture, a ground disk half assembly comprising two ground electrode plate disk halves that form an variable ground aperture, wherein the suppression disk half assembly is configured between the extraction electrode and the ground disk half assembly, wherein the suppression aperture and the ground aperture variable in the direction perpendicular to the ion beam direction of travel, and wherein the extraction electrode system is used with a pendulum reciprocating drive apparatus.