Variable Aperture Assembly for Ion Beam Shaping
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Solution Overview
Problem
Conventional ion implanters face challenges in effectively and economically shaping ion beams due to irregular shapes and non-uniform current distributions, with prior methods involving magnetic fields being complex and costly, and fixed apertures limiting adjustment flexibility.
Innovation Solution
A variable aperture assembly is introduced between the ion source and the wafer holder, allowing for adjustable size and shape of the aperture to shape the ion beam, using movable plates with openings to adjust the geometric relation and achieve desired ion beam profiles without affecting other implanter components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Shape
If magnetic fields are applied to shape the ion beam, then the ion beam shape is improved, but the device complexity and cost increase
Solution Approach 1:
The patent replaces the magnetic field system with a mechanical aperture system. Instead of using complex magnetic fields to shape the ion beam, the invention uses a simple aperture plate with geometric openings that physically define the beam shape. This mechanical substitution eliminates the need for magnetic field generation equipment while achieving the same beam shaping function.
Solution Approach 2:
The patent employs a simple, inexpensive aperture plate that can be easily replaced or adjusted. Rather than investing in complex and expensive magnetic field systems, the invention uses a straightforward mechanical component (aperture plate) that provides the necessary beam shaping at low cost and with minimal complexity.
2Adaptability or versatility
If multiple fixed aperture plates are used to achieve different ion beam shapes, then the ion beam shaping capability is improved, but the device complexity and operational complexity increase
Solution Approach 1:
The patent transforms the static, fixed aperture plate into a dynamic, adjustable system. The aperture plate can be moved along the ion beam path, and different portions of the plate can be selectively positioned to change the effective aperture shape. This dynamic adjustment capability provides versatility in beam shaping without requiring multiple separate plates, thereby reducing device complexity.
Solution Approach 2:
The patent designs a single aperture plate that can serve multiple functions by selective positioning. Instead of needing separate plates for each beam shape, one universal aperture plate with multiple possible positions or configurations can achieve various beam shapes. This multi-functionality reduces the number of components needed and simplifies the overall system.
3Adaptability or versatility
If fixed aperture plates are replaced with variable aperture plates, then the adjustment flexibility is improved, but the manufacturing complexity increases
Solution Approach 1:
The patent divides the aperture plate into segments or zones that can be independently positioned or adjusted. Rather than creating a complex continuously variable aperture mechanism, the invention segments the plate into discrete adjustable sections. This segmentation provides variable aperture capability while keeping each individual segment relatively simple to manufacture.
Solution Approach 2:
The patent introduces adjustability to the aperture plate through simple mechanical means such as movable sections or adjustable positioning mechanisms. This dynamic capability allows the aperture shape to be changed without requiring complex manufacturing processes, maintaining ease of manufacture while achieving versatility.
Data Source
AI summary
An ion implanter and an ion implant method are disclosed. The ion implanter has an aperture assembly with a variable aperture and is located between an ion source of an ion beam and a holder for holding a wafer. At least one of the size and the shape of the variable aperture is adjustable. The ion beam may be flexibly shaped by the variable aperture, so that the practical implantation on the wafer can be controllably adjusted without modifying an operation of both the ion source and mass analyzer or applying a magnetic field to modify the ion beam. An example of the aperture assembly has two plates, each having an opening formed on its edge such that a variable aperture is formed by a combination of these openings. By respectively moving the plates, the size and the shape of the variable aperture can be changed.