Variable Aperture Ion Beam Shaping for Implant Flexibility

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Solution Overview

Problem

Existing ion implantation technologies face challenges in achieving uniform ion beam distribution and dose control, requiring complex and costly adjustments to the ion source, analysis magnet, and magnet assemblies, with limited flexibility and high operational complexity, especially when dealing with substrates needing different doses or non-uniform implantation.

Innovation Solution

The use of a variable aperture device positioned at the end of the beam optics and in front of the substrate to shape the ion beam, allowing for flexible adjustment of the aperture's size and shape to optimize ion beam distribution and implantation, enabling different dose regions to be implanted with varying ion beams without re-tuning the hardware.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If magnet assembly is used to modify ion beam, then beam shape and size can be adjusted, but device complexity and cost increase significantly

Engineering Contradiction:

Improvebeam shape adjustmentVSAvoidmagnet assembly complexity

Core Design Contradiction:

Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent extracts the beam shaping function from the complex magnet assembly and relocates it to a simple aperture device positioned at the end of the beam line. This separates the beam generation function (magnet assembly) from the beam shaping function (aperture device), allowing each to be optimized independently and reducing overall system complexity.

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The aperture device serves as an intermediary element between the magnet assembly and substrate. It mediates the beam transformation process by physically shaping the ion beam through its aperture opening, replacing the need for complex magnetic field adjustments while maintaining beam control.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Manufacturing precision

If magnet assembly is used to modify ion beam, then beam distribution can be improved, but operational complexity increases

Engineering Contradiction:

Improvebeam distribution uniformityVSAvoidbeam adjustment operation

Core Design Contradiction:

Manufacturing precisionVSEase of operation

Solution Approach 1:

The patent replaces the mechanical/electromagnetic adjustment system (magnet assembly requiring current adjustments and geometric repositioning) with a simple mechanical aperture device. The aperture's fixed opening geometry directly defines the beam shape, eliminating complex operational procedures while achieving the desired beam distribution.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

3Device complexity

If fixed aperture is used to shape ion beam, then device complexity is reduced, but flexibility to adjust beam shape is limited

Engineering Contradiction:

Improveaperture device simplicityVSAvoidbeam shape flexibility

Core Design Contradiction:

Device complexityVSAdaptability or versatility

Solution Approach 1:

The patent implements a variable aperture device that can dynamically change its opening geometry during operation. The aperture shape and size can be adjusted to match different beam requirements, providing flexibility comparable to magnet assembly while maintaining the simplicity of a mechanical device. This dynamic capability allows the same simple device to adapt to various implantation scenarios.

Inventive Principle:

Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach simplifies the ion beam adjustment process, reduces costs, and increases flexibility, allowing for efficient implantation of different substrates with varying doses and shapes, accelerating the beam tune process while minimizing hardware changes and vacuum venting, thus improving the precision and uniformity of ion implantation.

Implementation Method 1

an ion beam 103 is generated by the ion source 101 and then analyzed by the analysis magnet 102

Methodology Applied

Scientific EffectIon beam: Ion Beam

Implementation Method 2

an aperture device 106 with a fixed aperture 107 to shape the ion beam 103 before the substrate 104 in implanted by the shaped ion beam 103

Methodology Applied

Scientific EffectPhysical containment: Physical Containment

Data Source

PatentUS9057129B2Implant method and implanter by using a variable aperture

Publication Date: 2015.06.16 ADVANCED ION BEAM TECHNOLOGY INC

AI summary

A variable aperture within an aperture device is used to shape the ion beam before the substrate is implanted by shaped ion beam, especially to finally shape the ion beam in a position right in front of the substrate. Hence, different portions of a substrate, or different substrates, can be implanted respectively by different shaped ion beams without going through using multiple fixed apertures or retuning the ion beam each time. In other words, different implantations may be achieved respectively by customized ion beams without high cost (use multiple fixed aperture devices) and complex operation (retuning the ion beam each time). Moreover, the beam tune process for acquiring a specific ion beam to be implanted may be accelerated, to be faster than using multiple fixed aperture(s) and/or retuning the ion beam each time, because the adjustment of the variable aperture may be achieved simply by mechanical operation.