Variable-Depth Device Structures via Cyclic Etching
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Solution Overview
Problem
Existing methods for fabricating optical devices for augmented and virtual reality struggle with non-uniform properties, making it challenging to effectively overlay virtual images on ambient environments.
Innovation Solution
A method involving a cyclic-etch process using gray-tone resist and selective etching techniques to form device structures with variable depths, allowing for the creation of nanostructures with precise control over depth and angle, suitable for use in optical devices like waveguides and metasurfaces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional fabrication methods are used for optical devices, then the manufacturing process is simpler, but the device structures exhibit non-uniform properties
Solution Approach 1:
The fabrication process is divided into multiple cyclic steps of depositing material layers and etching patterns. Each cycle creates a segment of the final variable-depth structure, allowing progressive formation of complex non-uniform geometries through repeated simple operations. This segmentation enables precise control over device structure uniformity while maintaining manageable process complexity.
Solution Approach 2:
The patent employs periodic deposition and etching cycles to build the device structure layer by layer. Each period consists of depositing a material layer followed by etching a pattern, repeated multiple times to accumulate the desired variable-depth structure. This periodic action transforms a complex single-step process into manageable periodic operations, achieving high manufacturing precision.
2Manufacturing precision
If multiple processing steps are used to achieve uniform device structures, then the manufacturing precision improves, but the productivity decreases
Solution Approach 1:
Multiple deposition and etching operations are merged into a single integrated cyclic process. Rather than treating each layer and pattern as separate manufacturing steps, the patent combines them into unified cycles that can be automated and executed continuously. This merging maintains high manufacturing precision while improving productivity by reducing process transitions and setup time.
Solution Approach 2:
The cyclic deposition-etching process is designed to continue without interruption, with each cycle seamlessly transitioning into the next. Material layers are deposited and etched in continuous succession, maximizing the utilization of manufacturing equipment and maintaining steady production flow. This continuity preserves manufacturing precision through consistent process conditions while significantly boosting fabrication throughput.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the fabrication of optical devices with higher resolution and fewer processing steps, resulting in improved uniformity and effectiveness in overlaying virtual images on ambient environments.
Implementation Method 1
developing the resist material to form a gray-tone pattern
Implementation Method 2
etching a resist segment of the gray-tone pattern using a resist etch process selective to the resist material and etching a device segment of the device material using a device pattern etch process selective to the device material
Data Source
Figure 1
Figure 2
Figure 3A~3B
AI summary
A method for forming a device structure is disclosed. The method of forming the device structure includes forming a variable-depth structure in a device material layer using cyclic-etch process techniques. A plurality of device structures is formed in the variable-depth structure to define vertical or slanted device structures therein. The variable-depth structure and the vertical or slanted device structures are formed using an etch process.