Variable-Height Spinal Implant with Articulating Distraction Mechanism
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Solution Overview
Problem
Conventional implantable devices for spinal realignment are limited by their standardized, non-adjustable configurations, which are insufficient for treating complex spinal curvatures and maladies such as scoliosis, kyphosis, and spondylolisthesis, as they cannot accommodate variable spinal structures.
Innovation Solution
The development of a variable-height implantable device with a distraction mechanism that allows for customizable adjustment of spinal alignment by articulating planar elements and utilizing a piston or mechanical arrangement to change the height of the implant, enabling correction of spinal deformities in the coronal, sagittal, and axial planes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If conventional standardized implantable devices are used, then manufacturing and surgical procedure are simplified, but the device cannot accommodate variable spinal structures and complex curvatures
Solution Approach 1:
The implantable device incorporates a distraction mechanism with planar elements that can articulate relative to one another, transforming the device from a static standardized configuration to a dynamic adjustable structure. This allows the device to adapt to variable spinal structures by enabling height adjustment on one or both sides of the implant through mechanical distraction and articulation of the planar elements.
Solution Approach 2:
The device enables parameter changes by allowing adjustment of the height of one or both sides of the implant through the distraction mechanism. The planar elements can articulate around at least one axis, changing the geometric parameters of the device to match the specific curvature and alignment requirements of different spinal structures, thereby resolving the contradiction between adaptability and complexity.
2Adaptability or versatility
If non-adjustable standardized implants are used, then device complexity is reduced, but the ability to treat complex spinal deformities is insufficient
Solution Approach 1:
The implantable device is segmented into a host member and a separate distraction mechanism. The host member provides the basic structural framework for surgical implantation, while the distraction mechanism can be independently adjusted after implantation. This segmentation allows the surgical procedure to remain relatively simple while enabling post-implantation customization to treat complex spinal deformities.
Solution Approach 2:
The distraction mechanism introduces dynamic adjustability to the otherwise static implant structure. The planar elements can articulate and the distraction mechanism can be activated to change heights, providing customizability for specific spinal applications without requiring completely custom-designed implants for each case, thus balancing ease of operation with adaptability.
3Manufacturing precision
If variable-height implantable devices with distraction mechanisms are used, then spinal realignment precision is improved, but device complexity increases
Solution Approach 1:
The distraction mechanism is nested within the host member structure. The planar elements are configured to articulate within the constraints of the host member, allowing the distraction mechanism to be contained within the overall implant structure. This nesting approach enables precise spinal alignment capability while containing the complexity within a unified device architecture.
Solution Approach 2:
The distraction mechanism utilizes articulation around at least one axis, introducing rotational freedom in another dimension. This allows the planar elements to change height and orientation through articulation, achieving precise spinal alignment in multiple planes while maintaining a relatively compact device structure through dimensional optimization.
Data Source
AI summary
Methods and apparatus for providing correction of one or more maladies or conditions of the spinal column of a living being. In one embodiment, the apparatus includes an implantable device configured to be selectively adjustable in one or more portions thereof so as to permit correction of asymmetries or irregularities of the spinal column via insertion into one or more affected intervertebral disc spaces. In one variant, the implantable device includes upper and lower host elements which are hinged or can pivot relative to one another, and an insertable distraction mechanism which is adjustable to enable one side or the other of the implantable device to alter height. In another variant, both sides of the implantable device can be adjusted for height via the host elements and one or more pivots or hinges. In one implementation, the distraction mechanism is adjustable from multiple approaches into the disc space.