Variable Nozzle Gas Supply for EUV Collector Mirror Contamination
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Solution Overview
Problem
In extreme ultraviolet light generation systems, the collector mirror unit becomes contaminated due to droplet deposits, leading to reduced reflectance and output, as existing uniform gas supply methods fail to effectively address non-uniform contamination patterns, resulting in inefficient light reflection and processing.
Innovation Solution
A variable nozzle system is employed, with a controller adjusting the shape of the spray holes based on contamination levels, allowing for flexible and targeted gas flow to the collector mirror unit, ensuring appropriate processing gas flow and distribution to remove contaminants effectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If uniform gas supply method is used to the collector mirror unit, then the gas supply system is simple, but it fails to effectively address non-uniform contamination patterns resulting in reduced reflectance and output
Solution Approach 1:
The gas supply system is divided into multiple nozzles positioned at different locations (peripheral and central areas) of the collector mirror unit, with each nozzle supplying processing gas to specific contaminated regions. This localised approach allows different areas of the mirror to receive gas supply tailored to their contamination patterns, thereby maintaining reflectance without requiring a completely complex uniform gas supply system
Solution Approach 2:
The gas supply system is segmented into multiple independent nozzles rather than a single uniform supply source. Each nozzle can be independently controlled and positioned to target specific contamination areas on the collector mirror unit, enabling effective cleaning of non-uniform contamination patterns while keeping the overall system architecture relatively simple
2Productivity
If variable nozzle shape adjustment is implemented, then gas flow distribution is optimized for contamination removal, but the device complexity increases
Solution Approach 1:
The nozzles are designed with adjustable spray hole shapes that can be dynamically changed based on contamination patterns. The controller adjusts the shape of spray holes in real-time to match the non-uniform contamination distribution on the collector mirror unit, optimizing gas flow distribution and contamination removal efficiency without requiring an overly complex control system
Solution Approach 2:
The spray hole shape parameter of the nozzles is made variable rather than fixed. By changing the shape parameter of spray holes according to contamination analysis results, the system optimizes gas flow distribution to match different contamination patterns, thereby improving productivity while adding only minimal complexity through parameter adjustment capability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the reflectance of the collector mirror unit by actively managing contamination, maintaining high output and efficiency in extreme ultraviolet light generation, even with non-uniform contamination patterns, by optimizing gas flow and distribution.
Implementation Method 1
a gas supply nozzle arranged in at least one area of the collector mirror unit and configured to supply the processing gas to a surface of the collector minor unit
Implementation Method 2
a controller configured to adjust a shape of a spray hole of the gas supply nozzle, wherein the shape of the spray hole is changed according to a control operation of the controller
Data Source
AI summary
Provided is an apparatus for generating extreme ultraviolet light. The apparatus includes a collector mirror unit, a gas supply unit configured to supply a processing gas to the collector mirror unit, a gas supply nozzle arranged in at least one area of the collector mirror unit and configured to supply the processing gas to a surface of the collector mirror unit, and a controller configured to adjust a shape of a spray hole of the gas supply nozzle. The shape of the spray hole may be changed according to a control operation of the controller.