Variable Resistance Memory Device Spacer Bridging Prevention

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing semiconductor memory devices face issues with bridging and current leakage due to conductive polymers, which can lead to degradation of switching elements and variable resistance patterns, affecting their electrical characteristics.

Innovation Solution

The semiconductor device incorporates a specific structure with spacers and metal patterns to prevent bridging and current leakage, featuring a variable resistance pattern between conductive lines, switching elements, and electrodes, with spacers on the sidewalls to isolate the conductive polymer layer and prevent it from connecting the electrodes, and a capping layer to cover the memory cells, thereby enhancing electrical characteristics.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If conductive polymer is used to fill gaps between cell structures, then manufacturing ease is improved, but bridging and current leakage occur between electrodes

Engineering Contradiction:
Improveease of manufactureVSAvoidelectrical characteristics
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

A spacer structure is introduced as an intermediary element between the conductive polymer and the electrodes. The spacer is positioned between the top surface of the second electrode and the bottom surface of the second conductive line, preventing direct contact between the conductive polymer and the electrode, thus eliminating the bridging issue while maintaining the gap-filling function

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The gap-filling function is segmented into two separate components: the conductive polymer fills the horizontal gaps between cell structures, while the spacer handles the vertical isolation requirement. This segmentation allows each component to perform its specific function without causing harmful effects

Inventive Principle:
Principle #1Segmentation

2Reliability

If spacer is added to prevent bridging, then reliability is improved, but device complexity increases

Engineering Contradiction:
Improveelectrical characteristicsVSAvoidstructure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The spacer structure serves multiple functions simultaneously: it prevents bridging between electrodes, provides mechanical support, defines the vertical boundary of the conductive polymer region, and acts as a barrier to current leakage. This multi-functionality reduces the need for additional separate structures

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Reliability

If conductive polymer connects electrodes, then electrical conductivity is improved, but current leakage and switching element degradation occur

Engineering Contradiction:
Improveelectrical characteristicsVSAvoidcurrent leakage
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The spacer acts as a mediating barrier that prevents the conductive polymer from directly connecting the electrodes. It allows the conductive polymer to maintain necessary electrical connections in horizontal directions while blocking harmful current leakage paths in vertical directions through the electrode region

Inventive Principle:
Principle #24Intermediary (Mediator)

Data Source

PatentUS11276821B2Variable resistance memory device
Publication Date: 2022.03.15 SAMSUNG ELECTRONICS CO LTD
  • US11276821B2 patent drawing
  • US11276821B2 patent drawing
  • US11276821B2 patent drawing

AI summary

A semiconductor device includes a plurality of first conductive lines disposed on a substrate, a plurality of second conductive lines intersecting the plurality of first conductive lines, and a plurality of cell structures interposed between the plurality of first conductive lines and the plurality of second conductive lines. At least one among the plurality of cell structures includes a first electrode, a switching element disposed on the first electrode, a second electrode disposed on the switching element, a first metal pattern disposed on the second electrode, a variable resistance pattern interposed between the first metal pattern and at least one among the plurality of second conductive lines, and a first spacer disposed on a sidewall of the variable resistance pattern, a sidewall of the first metal pattern and a sidewall of the second electrode.