Variable-Thickness Injector Structure for Deposition-Resistant Gas Delivery
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Solution Overview
Problem
Existing injectors in substrate processing apparatuses experience clogging and breakage due to deposition of reaction gases, which leads to inefficiencies and potential damage to substrates, particularly in vertical furnaces used for semiconductor wafer processing.
Innovation Solution
The injector is designed with a varying thickness along its axis, featuring an elongated shape with a larger width than depth and an oval cross-section, incorporating a gas conduction channel with varying thickness and a tapered end to reduce deposition and stress, made from materials with matching thermal expansion to the deposited films, and supported by a flange to minimize wiggling.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the injector is made with uniform wall thickness, then the manufacturing process is simple, but the injector experiences clogging and breakage due to deposition of reaction gases
Solution Approach 1:
The patent applies local quality by varying the wall thickness of the injector along its length. The wall thickness transitions from a first thickness at the inlet end to a second thickness at the outlet end, creating different local properties to address deposition issues in different regions. This non-uniform thickness distribution reduces deposition on the inner wall and minimizes stress concentration, thereby improving reliability without requiring complex external components.
2Productivity
If the injector operates for extended periods, then productivity increases, but deposition accumulates causing clogging and breakage
Solution Approach 1:
The patent changes the geometric parameter of wall thickness along the injector length to prevent deposition accumulation. By having the wall thickness vary from the inlet end to the outlet end, the gas flow dynamics and deposition patterns are altered, reducing material buildup on the inner wall. This parameter change allows the injector to operate for extended periods without clogging or breakage, thereby extending service life while maintaining productivity.
3Manufacturing precision
If the injector has larger width than depth, then gas distribution uniformity improves, but the injector becomes more susceptible to deposition
Solution Approach 1:
The patent addresses the deposition issue by applying local quality through varying wall thickness along the injector length. The different thickness regions create variations in gas flow velocity and pressure distribution, which prevent uniform deposition accumulation. This local variation in geometry counteracts the harmful deposition effect while preserving the overall wide cross-section design that provides good gas distribution uniformity.
Data Source
AI summary
The invention relates to an injector configured for arrangement within a reaction chamber of a substrate processing apparatus to inject gas in the reaction chamber. The injector may be elongated along a first axis and configured with an internal gas conduction channel extending along the first axis and provided with at least one gas entrance opening and at least one gas exit opening. The injector may have a width extending along a second axis perpendicular to the first axis substantially larger than a depth of the injector extending along a third axis perpendicular to the first and second axis. The wall of the injector may have a varying thickness.