VCSEL Array Metallization for Flexible Irregular Beam Patterns
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Solution Overview
Problem
The manufacturing of VCSEL arrays requires different sets of masks for regular and irregular patterns, leading to complex, inefficient, and costly processes.
Innovation Solution
A method to manufacture VCSEL arrays by forming them in a regular pattern and customizing the metallization or packaging to create different irregular patterns, allowing for the same regular-patterned arrays to be used as a basis for various irregular patterns, thereby standardizing the manufacturing process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If different sets of masks are used for regular and irregular VCSEL array patterns, then the manufacturing process can accommodate different pattern designs, but the process complexity and cost increase significantly
Solution Approach 1:
The patent divides the manufacturing process into two independent stages: (1) a standardized stage where all VCSELs are formed in a regular pattern with uniform spacing, and (2) a customization stage where selected VCSELs are disabled through ion implantation or physical covering to create the desired irregular pattern. This segmentation allows the complex pattern customization to be decoupled from the VCSEL fabrication process, using a single mask set for all arrays.
Solution Approach 2:
The patent performs preliminary formation of all VCSEL structures in a regular pattern before final pattern selection. By pre-forming complete VCSEL arrays with uniform spacing using standardized processes, the manufacturing foundation is established once, and subsequent pattern customization is achieved through selective disabling rather than re-fabrication, reducing overall process complexity.
2Adaptability or versatility
If different sets of masks are used for regular and irregular VCSEL array patterns, then various pattern designs can be manufactured, but the manufacturing cost increases
Solution Approach 1:
The manufacturing cost is reduced by segmenting the process into standardized VCSEL formation (using one mask set) and selective disabling (using low-cost ion implantation or simple covering layers). This eliminates the need for multiple expensive mask sets while maintaining the ability to produce various irregular patterns.
Solution Approach 2:
The patent changes the state of selected VCSELs from active to disabled through ion implantation or physical covering, rather than changing the manufacturing masks. This parameter change approach allows pattern customization at lower cost by modifying the operational state of pre-fabricated VCSELs rather than re-fabricating them with different masks.
3Adaptability or versatility
If different sets of masks are used for regular and irregular VCSEL array patterns, then different patterns can be produced, but the turnaround time increases
Solution Approach 1:
By preliminarily forming all VCSEL structures in a regular pattern using a single standardized process, the patent eliminates the need to re-run fabrication processes for different patterns. The turnaround time is reduced because pattern customization is achieved through rapid selective disabling rather than time-consuming re-fabrication with different masks.
Solution Approach 2:
The patent segments the time-consuming fabrication process from the pattern customization process. The standardized VCSEL formation is performed once, and subsequent pattern changes are achieved through rapid selective disabling operations, significantly reducing the turnaround time for producing different irregular patterns.
Data Source
AI summary
A VCSEL array and the method of manufacturing the array are disclosed. The VCSEL array comprises a substrate and a plurality of VCSEL structures formed on the substrate in a regular pattern. A customized metal layer is deposited to electrically connect a selected number but not all of the plurality of VCSEL structures. The selected number of VCSEL structures form an array of a predetermined irregular pattern.