Ventilated Wafer Puck With Labyrinth Channel for Gas Exchange

The ventilation channel is segmented into multiple sections including inlet, labyrinth structure, and outlet portions, allowing gas to flow through while preventing dust entry. The channel divides the sealed structure into functional zones that simultaneously achieve sealing and ventilation.

The ventilation channel acts as an intermediary structure between the sealed interior and exterior environment. It mediates gas exchange while filtering out dust particles through its labyrinthine design, allowing beneficial gas flow while blocking harmful contaminants.

The ventilation channel employs curved and zigzag pathways instead of straight lines, creating a labyrinth structure that forces gas to follow a tortuous path. This curved geometry increases flow resistance for dust particles while allowing gas molecules to pass through more easily.

The ventilation channel structure creates a porous-like pathway system with multiple openings and passages. The labyrinthine configuration provides numerous flow paths for gas while the complex geometry acts as a physical barrier that traps and removes dust particles from the gas stream.

The ventilation channel provides dynamic pressure relief during inflation and vacuum processes. By allowing continuous gas exchange, the channel prevents excessive pressure buildup that would otherwise compress the puck and spider plate onto the wafer, maintaining stable internal pressure that protects wafer surface quality.

The harmful compression force is extracted or relieved through the ventilation channel. The channel enables excess gas to escape during inflation, preventing over-pressurization that would cause the puck to compress and damage the wafer surface, while maintaining sufficient sealing for protection.