Venturi Gap Turntable for Double-Sided Wafer Protection
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Solution Overview
Problem
Existing substrate machining devices, particularly spin coaters, often damage or contaminate the rear side of double-sided wafers during the machining process due to the penetration of machining media.
Innovation Solution
A device with a turntable featuring a Venturi gap that uses compressed air to securely hold substrates in place during rotation, preventing the machining medium from reaching the rear side and incorporating design elements like defined edges, holes, and a diffuser for controlled pressure distribution and substrate positioning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a spin coater is used to apply machining medium to substrates, then the substrate can be coated uniformly, but the machining medium penetrates to the rear side of the substrate and damages or contaminates it
Solution Approach 1:
The patent introduces a vertical dimension constraint by placing a rear side protection element between the substrate and the turntable surface. This element extends upward to contact the rear side of the substrate, creating a physical barrier that prevents machining medium from reaching the rear side while allowing the spin coating process to continue on the front side.
Solution Approach 2:
The rear side protection element acts as an intermediary component that mediates between the substrate and the turntable. It provides mechanical support to hold the substrate in position while simultaneously serving as a barrier to prevent harmful machining medium from contaminating the rear side of the substrate.
2Stability of the object's composition
If the substrate is held firmly on the turntable during rotation, then the substrate remains stable, but the machining medium can still reach the rear side and cause damage
Solution Approach 1:
The protection element adds a vertical barrier dimension that extends from the turntable surface upward to contact the substrate rear side. This creates a three-dimensional containment structure that stabilizes the substrate while blocking the path of machining medium.
Solution Approach 2:
The rear side protection element serves as a mediator that provides both mechanical stabilization and harmful factor isolation. It contacts the substrate rear side to prevent excessive movement while simultaneously blocking machining medium from reaching sensitive areas.
3Stability of the object's composition
If compressed air is delivered through the Venturi gap to hold the substrate, then the substrate is securely positioned, but the pressure distribution must be precisely controlled
Solution Approach 1:
The patent employs a Venturi gap mechanism that utilizes compressed air flow to create a vacuum effect for substrate holding. The Venturi geometry naturally creates pressure differential through airflow, eliminating the need for additional vacuum pumps or complex pressure control systems.
Solution Approach 2:
The Venturi gap structure is self-regulating through fluid dynamics principles. As compressed air flows through the constricted Venturi section, it automatically creates the necessary vacuum pressure to hold the substrate without requiring external control mechanisms.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents damage and contamination of the rear side of substrates by maintaining the substrate's position and controlling the flow of machining media, ensuring precise and clean processing, especially for double-sided wafers.
Implementation Method 1
Compressed air or some other medium is preferably delivered through the Venturi gap. This results in several advantages. The first advantage is that, as a result, the substrate is drawn in in accordance with the Venturi principle, and is held on the turntable
Implementation Method 2
Another advantage is that the rear side remains clean and the treatment medium cannot run onto the rear side and contaminate or damage it
Data Source
AI summary
In a device for machining, in particular etching and/or developing, substrates, in particular wafers, in particular etching and/or developing, having a turntable, the turntable has a Venturi gap.