Vertical Coating and Developing Apparatus with Inline Inspection

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Solution Overview

Problem

Existing coating and developing apparatuses for semiconductor wafers and LCD substrates face inefficiencies in substrate transfer and inspection due to space constraints and complex transfer channel layouts, particularly when incorporating a substrate inspection unit, which hampers throughput and space utilization.

Innovation Solution

The apparatus features a vertically arranged process block with coating and developing parts, incorporating a substrate inspection unit within these parts to avoid protrusions and optimize space, utilizing transfer mechanisms that allow direct and efficient substrate transfer between carrier, process, and interface blocks, enhancing throughput and space efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If a substrate inspection unit is added to the coating and developing apparatus, then inspection capability is improved, but device complexity and space occupation increase

Engineering Contradiction:

Improveinspection capabilityVSAvoiddevice complexity

Core Design Contradiction:

Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The substrate inspection unit is merged with the coating and developing apparatus by integrating it into the process block. The inspection unit shares the same housing and substrate transfer mechanisms as the coating and developing parts, allowing inspection to be performed inline without requiring a separate standalone inspection apparatus.

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The inspection unit is arranged in a vertical stacking configuration within the process block, utilizing the vertical dimension to accommodate additional functionality without significantly increasing the horizontal footprint. This allows the inspection unit to be integrated into the existing apparatus structure.

Inventive Principle:

Principle #17Another dimension (Dimensionality change)

2Adaptability or versatility

If the substrate inspection unit is connected to the carrier block or interface block, then inspection function is achieved, but the transfer channel becomes complex and substrate transfer efficiency decreases

Engineering Contradiction:

Improveinspection functionVSAvoidsubstrate transfer efficiency

Core Design Contradiction:

Adaptability or versatilityVSProductivity

Solution Approach 1:

The process block is segmented into distinct functional regions: a coating film forming part for resist coating, a developing part for pattern development, and an inspection unit for substrate inspection. Each segment has its own substrate transfer mechanism, allowing independent operation and optimized transfer paths without requiring complex inter-block coordination.

Inventive Principle:

Principle #1Segmentation

3Area of stationary object

If the substrate inspection unit is disposed in the process block, then space occupation is reduced, but the transfer channel layout becomes complex

Engineering Contradiction:

Improvespace occupationVSAvoidtransfer channel layout

Core Design Contradiction:

Area of stationary objectVSDevice complexity

Solution Approach 1:

Inventive Principle:

Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

Inventive Principle:

Principle #1Segmentation

4Adaptability or versatility

If a standalone inspection apparatus is used, then inspection capability is achieved, but space utilization in clean rooms decreases especially for larger substrates

Engineering Contradiction:

Improveinspection capabilityVSAvoidspace utilization

Core Design Contradiction:

Adaptability or versatilityVSArea of stationary object

Solution Approach 1:

Inventive Principle:

Principle #5Merging (Combining)

Data Source

PatentUS8313257B2Coating and developing apparatus, substrate processing method, and storage medium

Publication Date: 2012.11.20 TOKYO ELECTRON LTD

AI summary

A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units and transfer mechanisms A3 and A4, and a developing part B1 including a plurality of process units 31 and a transfer mechanism A1 are vertically arranged in a process block S2. There are disposed in the process block S2 on a side of a carrier block S1, a plurality of vertically arranged transfer units TRS for transferring a substrate W between the same and transfer mechanisms for the respective parts, and a vertically movable transfer mechanism D1 for the transfer unit for transferring a substrate between these transfer units. At least one of the coating film forming part and the developing part includes a substrate inspection unit 43 for inspecting a substrate transferred by the transfer mechanism for the corresponding part.