Vertical Power Gate Circuits for Semiconductor Area Reduction

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

The increasing demand for smaller electronic products with higher density integrated circuits poses a challenge in reducing the size of power gate circuits, which are typically large and consume significant area on semiconductor dies, while also needing to manage power consumption effectively in battery-operated devices.

Innovation Solution

The use of vertically oriented p-channel and n-channel transistors in power gate circuits, which are activated or deactivated based on control signals to provide power only when necessary, reducing power consumption and minimizing circuit area by using conductive structures that extend along the length of the power gate circuits.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Power

If power gate circuits are designed to carry sufficient power to various circuits when activated, then power delivery capability is improved, but circuit area increases significantly

Engineering Contradiction:
Improvepower delivery capabilityVSAvoidcircuit area
Core Design Contradiction:
PowerVSArea of stationary object

Solution Approach 1:

The patent transitions from planar transistor layout to vertically stacked three-dimensional transistor structures. Multiple transistor layers are stacked vertically between common source and drain regions, enabling higher power delivery capability through increased transistor count without proportionally increasing the lateral circuit area. This vertical stacking approach directly resolves the contradiction by adding power capacity in the vertical dimension rather than expanding horizontally.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Power

If power gate circuits are made larger to carry sufficient power, then power delivery capability is improved, but density of integrated circuits decreases

Engineering Contradiction:
Improvepower delivery capabilityVSAvoidcircuit density
Core Design Contradiction:
PowerVSProductivity

Solution Approach 1:

By stacking transistors vertically in multiple layers between common source and drain regions, the patent achieves higher power delivery capability within a compact lateral footprint. This vertical stacking enables more functional blocks to be integrated on the same die area, thereby maintaining or improving circuit density while providing sufficient power delivery capacity for each block.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Use of energy by stationary object

If conventional power gate circuits are used, then power consumption control is achieved, but circuit area remains large

Engineering Contradiction:
Improvepower consumption controlVSAvoidcircuit area
Core Design Contradiction:
Use of energy by stationary objectVSArea of stationary object

Solution Approach 1:

The patent employs vertically stacked transistor structures that provide the necessary power delivery capability in a compact three-dimensional configuration. This approach maintains effective power consumption control by enabling selective activation of functional blocks while significantly reducing the lateral area occupied by power gate circuits compared to conventional planar designs.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

Multiple transistor layers are merged and stacked vertically to form a unified power gate structure. This consolidation achieves the required power delivery capability through the combined effect of stacked transistors sharing common source and drain regions, thereby reducing the overall circuit area compared to using separate planar transistor structures for each power delivery path.

Inventive Principle:
Principle #5Merging (Combining)

Data Source

PatentUS10804225B2Power gate circuits for semiconductor devices
Publication Date: 2020.10.13 MICRON TECHNOLOGY INC
  • US10804225B2 patent drawing
  • US10804225B2 patent drawing
  • US10804225B2 patent drawing

AI summary

Apparatuses and methods for gate power to circuits of semiconductor devices are described. An example apparatus includes a substrate, a first wiring and a second wiring, and a plurality of transistors. The first wiring may be supplied with a power voltage, and the first wiring is formed over the substrate and is elongating in a first direction. The second wiring may be formed between the substrate and the first wiring, and vertically overlapping the first wiring with the second wiring elongating in the first direction. The plurality of transistors are vertically coupled between the first wiring and the second wiring.