Vertical Substrate Treatment Lines for High-Throughput Processing

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Solution Overview

Problem

Conventional substrate treating apparatuses face limitations in throughput due to the need for multiple transporting steps and the inability to reduce the number of transport mechanisms without increasing the footprint, making it difficult to enhance processing efficiency.

Innovation Solution

The apparatus features multiple substrate treatment lines arranged vertically with horizontal main transport mechanisms, allowing substrates to be treated in parallel and reducing the installation area, while maintaining cleanliness through gas supply and exhaust systems and efficient indexer transport mechanisms.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If multiple main transport mechanisms are employed to improve throughput, then productivity increases, but the footprint of the apparatus enlarges

Engineering Contradiction:
ImprovethroughputVSAvoidfootprint
Core Design Contradiction:
ProductivityVSArea of stationary object

Solution Approach 1:

The patent transitions from a horizontal arrangement of multiple transport mechanisms to a vertical arrangement of multiple substrate treatment lines. Each line has its own horizontal transport mechanism, but the lines are stacked vertically to achieve parallel processing without increasing the horizontal footprint. This dimensional change allows throughput improvement while maintaining a compact apparatus size.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Productivity

If the number of transporting steps is reduced to improve throughput, then productivity increases, but the treatment completeness deteriorates

Engineering Contradiction:
ImprovethroughputVSAvoidtreatment completeness
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent divides the substrate treatment system into multiple independent treatment lines, each capable of completing the full series of treatments. Each line includes complete treating units (coating, heating, developing) and transport mechanisms. This segmentation allows parallel processing while ensuring each substrate receives complete treatment in its dedicated line, maintaining treatment completeness while improving throughput.

Inventive Principle:
Principle #1Segmentation

3Productivity

If multiple substrate treatment lines are arranged vertically to improve throughput, then productivity increases, but the device complexity increases

Engineering Contradiction:
ImprovethroughputVSAvoidconstruction complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent combines multiple substrate treatment lines into a single integrated apparatus with shared structural components, control systems, and utility connections. The vertical arrangement allows lines to be merged into one cohesive structure, reducing overall complexity compared to separate horizontal systems. The treating units and transport mechanisms are coordinated through a unified control architecture.

Inventive Principle:
Principle #5Merging (Combining)

Data Source

PatentUS8851008B2Parallel substrate treatment for a plurality of substrate treatment lines
Publication Date: 2014.10.07 SOKUDO CO LTD
  • US8851008B2 patent drawing
  • US8851008B2 patent drawing
  • US8851008B2 patent drawing

AI summary

A substrate treating apparatus includes a plurality of substrate treatment lines arranged vertically. Each substrate treatment line has a plurality of main transport mechanisms arranged horizontally, and a plurality of treating units provided for each main transport mechanism for treating substrates. A series of treatments is carried out for the substrates, with each main transport mechanism transporting the substrates to the treating units associated therewith, and transferring the substrates to the other main transport mechanism horizontally adjacent thereto. The substrate treating apparatus realizes increased processing capabilities by treating the substrates in parallel through the substrate treatment lines.