Vertical Substrate Processing Apparatus Compact Chamber Design

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Solution Overview

Problem

Conventional substrate processing apparatuses for large-area substrates face challenges in cost efficiency, space requirements, and uniform processing due to increased size and energy consumption, particularly when using rapid thermal processing methods for graphene synthesis.

Innovation Solution

A substrate processing apparatus with a compact chamber design integrating the heat source, featuring a main heat source and an auxiliary heat source unit, and a substrate support system that reduces the distance between the heat source and the substrate, allowing for efficient and uniform heating of large-area substrates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of moving object

If the chamber size is increased to process large-area substrates, then the substrate processing capability is improved, but the facility cost and installation space requirements increase

Engineering Contradiction:
Improvesubstrate processing areaVSAvoidinstallation space
Core Design Contradiction:
Area of moving objectVSArea of stationary object

Solution Approach 1:

The patent changes the substrate loading direction from horizontal to vertical orientation. The substrate is loaded through the top of the chamber and held vertically by the substrate holder, allowing large-area substrates to be processed without increasing the chamber's horizontal footprint. This dimensional change enables processing of large substrates while maintaining compact installation space.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Device complexity

If the distance between heat source and substrate is increased to accommodate heat source installation space, then the heat source unit installation is facilitated, but the energy consumption increases

Engineering Contradiction:
Improveheat source installation spaceVSAvoidenergy consumption
Core Design Contradiction:
Device complexityVSUse of energy by moving object

Solution Approach 1:

The heat source is arranged vertically along the side wall of the chamber rather than horizontally at the bottom, changing the spatial relationship between heat source and substrate. This vertical arrangement allows the heat source to be installed without increasing the distance to the vertically-oriented substrate, maintaining heating efficiency while providing installation space.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The heat source unit is integrated into the chamber structure by nesting it within the side wall space. The heat source is positioned within the chamber volume rather than occupying external space, allowing compact integration while maintaining effective heating distance to the substrate.

Inventive Principle:
Principle #7Nested doll (Nesting)

3Area of moving object

If the substrate is loaded in horizontal direction for large area processing, then the substrate area is accommodated, but the substrate hangs downward due to self weight causing non-uniform processing

Engineering Contradiction:
Improvesubstrate areaVSAvoidprocessing uniformity
Core Design Contradiction:
Area of moving objectVSManufacturing precision

Solution Approach 1:

The substrate orientation is changed from horizontal to vertical position. The substrate holder grasps the substrate vertically, preventing the substrate from hanging downward under its own weight. This vertical orientation eliminates the deformation issue while accommodating large-area substrates through the top-loading mechanism.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration reduces facility costs, enhances processing efficiency, and ensures stable, uniform heating of large-area substrates, improving the reliability of materials like graphene synthesized during the process.

Implementation Method 1

a heat source unit illuminating radiation beam to heat up the substrate

Methodology Applied
Scientific EffectRadiation beam heating: Thermal Radiation

Data Source

PatentUS10643868B2Apparatus for processing substrate
Publication Date: 2020.05.05 NPS CORP
  • US10643868B2 patent drawing
  • US10643868B2 patent drawing
  • US10643868B2 patent drawing

AI summary

The present invention relates to a substrate processing apparatus, comprising, a chamber comprising a base frame formed to open at least a part of faces extending in vertical direction and horizontal direction, a main heat source provided in a row with isolation on an opened face of the base frame, and a block which is connected to the opened face of the base frame and forms a space in the base frame in which the substrate is processed; and a substrate support portion which is provided in the chamber and supports the substrate, and by integrating the chamber and the heat source, the size of the chamber itself is reduced, the space can be used efficiently with reduced installation space, and facilities cost can be saved.