Vertical Substrate Treatment Lines for Higher Throughput

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Solution Overview

Problem

Conventional substrate treating apparatuses face limitations in throughput due to the need for multiple transporting steps and the challenge of increasing the number of main transport mechanisms, which enlarges the footprint and complicates the apparatus construction.

Innovation Solution

The apparatus features multiple substrate treatment lines arranged vertically with horizontal main transport mechanisms, allowing parallel treatment of substrates and maintaining a compact footprint by optimizing the arrangement of treating units and gas supply/exhaust systems, and incorporating an indexer's transport mechanism for efficient substrate transfer.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If multiple main transport mechanisms are employed to improve throughput, then productivity increases, but device complexity and footprint area increase

Engineering Contradiction:
ImprovethroughputVSAvoidapparatus construction
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The apparatus is divided into multiple independent substrate treatment lines (first and second lines), each with its own transport mechanism and treating units. This segmentation allows parallel processing of substrates in different lines, improving throughput while keeping each line's complexity manageable and modular.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The substrate treatment lines are arranged vertically (one above the other) rather than horizontally. This vertical arrangement allows multiple transport mechanisms to operate in parallel without proportionally increasing the horizontal footprint area, thus improving productivity while controlling the apparatus size.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Productivity

If multiple main transport mechanisms are employed to improve throughput, then productivity increases, but footprint area increases

Engineering Contradiction:
ImprovethroughputVSAvoidfootprint area
Core Design Contradiction:
ProductivityVSArea of stationary object

Solution Approach 1:

The substrate treatment lines are arranged vertically (one above the other) rather than horizontally. This vertical arrangement allows multiple transport mechanisms to operate in parallel without proportionally increasing the horizontal footprint area, thus improving productivity while controlling the apparatus size.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Productivity

If the number of transporting steps is reduced to improve throughput, then productivity increases, but manufacturing precision may deteriorate

Engineering Contradiction:
ImprovethroughputVSAvoidsubstrate treatment quality
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The apparatus is divided into multiple independent substrate treatment lines, each capable of performing complete substrate treatment sequences. This segmentation allows parallel processing without reducing the number of treatment steps per substrate, maintaining manufacturing precision while improving overall throughput through simultaneous processing of multiple substrates in different lines.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentEP2009671B1Substrate treating apparatus
Publication Date: 2016.05.04 SCREEN SEMICON SOLUTIONS CO LTD
  • EP2009671B1 patent drawingFigure 1
  • EP2009671B1 patent drawingFigure 2
  • EP2009671B1 patent drawingFigure 3

AI summary

A substrate treating apparatus includes a plurality of substrate treatment lines arranged vertically. Each substrate treatment line has a plurality of main transport mechanisms arranged horizontally, and a plurality of treating units provided for each main transport mechanism for treating substrates. A series of treatments is carried out for the substrates, with each main transport mechanism transporting the substrates to the treating units associated therewith, and transferring the substrates to the other main transport mechanism horizontally adjacent thereto. The substrate treating apparatus realizes increased processing capabilities by treating the substrates in parallel through the substrate treatment lines.