Vertical Substrate Transfer Layout to Prevent Cleaning Solution Loss
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Solution Overview
Problem
Conventional substrate processing systems face issues with cleaning solution spillage and loss during horizontal transfer between cleaning and drying devices, and inaccurate weight measurement due to shaking during substrate transfer.
Innovation Solution
A substrate processing system with a vertical arrangement of cleaning and drying devices, separate transfer and weight measurement units, and a hinge-driven weight measurement mechanism to minimize solution loss and enhance measurement accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If cleaning device and drying device are arranged horizontally, then substrate transfer is simple, but cleaning solution spills and is lost during transfer
Solution Approach 1:
The patent changes the arrangement from horizontal to vertical dimension. The cleaning device is positioned above the drying device, and the substrate is transferred vertically downward. This dimensional change allows gravity to assist the transfer process while preventing cleaning solution from spilling sideways, thus resolving the contradiction between transfer simplicity and solution loss prevention.
2Device complexity
If weight measuring device is integrated in transfer unit, then structure is compact, but measurement accuracy decreases due to shaking during transfer
Solution Approach 1:
The patent separates the weight measuring device from the transfer unit into independent functional modules. The substrate is first transferred to the weight measuring device, weighed, and then transferred to the drying device. This segmentation allows the weighing process to occur when the substrate is stationary, eliminating measurement errors caused by transfer shaking, while maintaining overall system compactness through vertical arrangement.
3Length of moving object
If substrate is transferred horizontally from cleaning to drying device, then transfer path is short, but cleaning solution drifts to one side
Solution Approach 1:
The patent transitions from horizontal to vertical transfer path. The substrate moves vertically downward from the cleaning device to the drying device under gravity. This eliminates the sideways drift of cleaning solution that occurs during horizontal transfer, as the vertical direction naturally contains the liquid flow along the transfer path.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The vertical arrangement prevents cleaning solution spillage and loss, while separate units and accurate weight measurement improve transfer efficiency and reduce measurement errors.
Implementation Method 1
the first position and the second position may be vertically arranged... preventing a cleaning solution from spilling onto a substrate
Data Source
AI summary
A substrate processing system, according to one embodiment, comprises: a cleaning device, positioned at a first position, for performing a cleaning process for a substrate; a drying device, positioned at a second position, for performing a drying process for the substrate; and a transfer unit for transferring the substrate from the cleaning device to the drying device, wherein the first position and the second position may be vertically arranged.