Vertical Substrate Transfer for Compact OLED Deposition

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Solution Overview

Problem

Current substrate deposition systems for OLED displays are inefficient due to large transfer and process chamber sizes and prolonged processing times, primarily because substrates are horizontally transferred, leading to increased space requirements and processing time.

Innovation Solution

A substrate deposition system that vertically transfers substrates using a substrate transfer device with moving and rotating members, reducing chamber sizes and processing time by allowing simultaneous substrate transfer and deposition in vertically oriented chambers.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If substrates are horizontally transferred in conventional deposition systems, then the transfer and process chambers can accommodate standard substrate loading, but the chamber sizes become large and processing time is prolonged

Engineering Contradiction:
Improveprocessing speedVSAvoidchamber size
Core Design Contradiction:
ProductivityVSVolume of stationary object

Solution Approach 1:

The patent transitions from horizontal substrate transfer to vertical substrate transfer, changing the spatial dimension of the deposition process. The substrate is transferred vertically from the load-lock chamber through the transfer chamber to the deposition chamber, and deposition is performed in a vertical direction. This dimensional change allows for more compact chamber design and faster processing by eliminating the need for large horizontal transfer paths.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Volume of stationary object

If vertical substrate transfer is implemented, then chamber sizes are reduced and processing time is shortened, but the substrate transfer device becomes more complex with moving and rotating members

Engineering Contradiction:
Improvechamber sizeVSAvoidtransfer device structure
Core Design Contradiction:
Volume of stationary objectVSDevice complexity

Solution Approach 1:

The patent combines multiple functions into the substrate transfer device. The transfer device includes both moving members that transport the substrate vertically and rotating members that orient the substrate, integrating transfer and orientation functions into a single coordinated system. This merging reduces the need for separate devices and simplifies the overall system architecture despite the vertical transfer complexity.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The substrate transfer device is designed with multi-functionality, where the same device performs both substrate transfer and substrate orientation tasks. The moving members handle vertical transport while the rotating members adjust substrate orientation, allowing a single integrated device to perform multiple operations that would traditionally require separate mechanisms.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Loss of time

If vertical deposition is used, then processing time is reduced through simultaneous substrate transfer and deposition, but the substrate fixing devices and depositing source arrangement becomes more complex

Engineering Contradiction:
Improveprocessing timeVSAvoidchamber configuration
Core Design Contradiction:
Loss of timeVSDevice complexity

Solution Approach 1:

The patent implements continuous processing by enabling simultaneous substrate transfer and deposition operations. While the substrate is being transferred vertically through the transfer chamber, the deposition process begins in the deposition chamber. This continuity eliminates idle time between transfer and deposition, maintaining constant productive action throughout the process.

Inventive Principle:
Principle #20Continuity of useful action

Solution Approach 2:

The substrate is pre-oriented and positioned in the vertical configuration during transfer, preparing it in advance for the deposition process. The rotating members orient the substrate vertically before it reaches the deposition chamber, so that when deposition begins, the substrate is already in the optimal position, eliminating the need for post-transfer orientation adjustments.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The system reduces the size of the deposition system and processing time, enhancing productivity by enabling efficient vertical substrate transfer and simultaneous deposition in multiple chambers, thereby improving the efficiency of OLED display production.

Implementation Method 1

the vacuum deposition method is used to form an organic thin film in a vapor deposition apparatus that includes an organic material evaporation source having a crucible by inserting a vapor deposition material in the crucible and depositing the vapor deposition material by heating the crucible to a predetermined temperature

Methodology Applied
Scientific EffectVapor deposition: Physical Vapour Deposition

Data Source

PatentUS8802488B2Substrate depositing system and depositing method using the same
Publication Date: 2014.08.12 SAMSUNG DISPLAY CO LTD
  • US8802488B2 patent drawing
  • US8802488B2 patent drawing
  • US8802488B2 patent drawing

AI summary

A substrate depositing system and a method of using a substrate depositing system. A substrate depositing system includes a load-lock chamber for loading and unloading a substrate, at least one transfer chamber connected to the load-lock chamber and including a substrate transfer device configured to vertically transfer the substrate, and a pair of depositing chambers connected to opposite sides of the at least one transfer chamber and including a depositing source and a pair of substrate fixing devices, the substrate transfer device including a pair of substrate installing members.