Vertical Substrate Treatment Cell Layout for Higher Throughput

The substrate treatment process is segmented into multiple independent treatment lines (first treatment line and second treatment line), each capable of processing substrates independently. This segmentation allows parallel processing without requiring multiple complex main transport mechanisms, as each line has its own simplified transport system working simultaneously with other lines.

The patent transitions from a single-plane horizontal arrangement to a three-dimensional configuration by stacking treatment lines vertically (upper and lower levels). This dimensional change enables parallel processing in the vertical dimension while maintaining simplified horizontal transport mechanisms within each level, thereby increasing throughput without proportionally increasing footprint area.

Each treatment line is segmented into dedicated functional blocks (coating block, developing block, heat treatment block, etc.) that perform specific treatments in sequence. This segmentation ensures that each substrate receives complete treatment within each line while parallel lines process other substrates simultaneously, maintaining treatment quality without sacrificing throughput.

The patent implements continuous substrate transport and treatment through each line without interruption. Substrates move continuously through coating, heat treatment, developing, and drying processes in each line, eliminating idle time and ensuring consistent treatment quality while maximizing productivity through parallel continuous operations.