Vertically Integrated Image Sensor with Programmable Pinning Layers
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Solution Overview
Problem
Small pixel image sensors face challenges with poor quantum efficiency due to electrical conductor placement, low photodetector charge capacity, and grid distortions leading to color crosstalk, as well as inadequate global electronic shutter performance and infrared sensitivity.
Innovation Solution
A vertically integrated image sensor design featuring front-side and backside photodetectors with programmable pinning layers, allowing for adjustable electrostatic barriers to enhance charge transfer and separation, enabling high sensitivity and low noise global shutter operation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Use of energy by moving object
If back-illuminated image sensor is used, then quantum efficiency performance is improved, but manufacturing complexity increases due to wafer bonding and thinning process
Solution Approach 1:
The image sensor is divided into front-side photodetectors and backside photodetectors that are vertically integrated but functionally separable. The pinning layers are segmented into front-side and backside components that can be independently controlled through separate contact structures, allowing independent optimization of each photodetector type while simplifying the manufacturing process.
Solution Approach 2:
Instead of using the conventional back-illuminated structure with complex wafer bonding and thinning, the patent inverts the approach by implementing a front-side illuminated sensor with vertically integrated photodetectors where the backside photodetectors are formed through standard CMOS processing without requiring wafer bonding or thinning operations.
2Manufacturing precision
If small pixel design is used, then resolution is improved, but photodetector charge capacity decreases
Solution Approach 1:
The patent transitions from a two-dimensional planar photodetector design to a three-dimensional vertically integrated structure. By stacking front-side and backside photodetectors vertically, the charge capacity is increased without increasing the lateral pixel area, thereby maintaining high resolution while enhancing charge storage capability.
Solution Approach 2:
The front-side photodetectors and backside photodetectors are merged into a single vertically integrated photodetector structure within each pixel. This combination allows the pixel to utilize the full depth of the substrate for charge generation and storage, effectively increasing charge capacity without increasing pixel footprint.
3Use of energy by moving object
If back-illuminated image sensor is used, then quantum efficiency is improved, but color crosstalk increases due to grid distortions
Solution Approach 1:
The color filter array is segmented into front-side color filters and backside color filters that are vertically aligned with their respective photodetectors. This segmentation, combined with the vertically integrated photodetector structure, maintains precise color alignment without requiring complex wafer bonding processes that cause grid distortions.
4Reliability
If large pixel architecture is used, then global electronic shutter performance is improved, but pixel area increases
Solution Approach 1:
The patent implements global electronic shutter functionality by utilizing the vertical dimension of the vertically integrated photodetector structure. Transfer gates are positioned vertically between the front-side and backside photodetectors, allowing charge transfer and shutter operation without requiring additional lateral space that would increase pixel area.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design improves photodetector charge capacity, reduces color crosstalk, and enables high-performance global electronic shutter and mixed spectrum imaging, increasing sensitivity and reducing system complexity and cost.
Implementation Method 1
an electrostatic barrier is produced between the front-side photodetector and the backside photodetector by adjusting an adjustable and programmable potential on the backside pinning layer
Implementation Method 2
light-sensitive photodetectors that convert incident light into electrical signals
Data Source
AI summary
An image sensor includes front-side and backside photodetectors of a first conductivity type disposed in a substrate layer of the first conductivity type. A front-side pinning layer of a second conductivity type is connected to a first contact. The first contact receives a predetermined potential. A backside pinning layer of the second conductivity type is connected to a second contact. The second contact receives an adjustable and programmable potential.


