VGF Crystal Growth via Reverse Injection Synthesis

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Solution Overview

Problem

Current methods for continuous VGF crystal growth of semiconductor materials like indium phosphide require additional polycrystalline materials for seed crystal protection, which complicates the synthesis and increases costs, and do not efficiently manage volatile elements during the growth process.

Innovation Solution

A device and method for continuous VGF crystal growth through reverse injection synthesis, utilizing a furnace with a crucible having capillary pores for communication between synthesis and crystal growth units, allowing volatile elements to react with metal melts under precise temperature and pressure control, ensuring effective isolation and protection of the seed crystal.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If additional polycrystalline materials are used for seed crystal protection, then the seed crystal is protected from corrosion and melting, but the synthesis process becomes more complex and costs increase

Engineering Contradiction:
Improveseed crystal protectionVSAvoidsynthesis process complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The invention extracts and removes the unnecessary polycrystalline material protection step from the synthesis process. By using a suspended seed crystal method where the seed crystal is directly suspended in the vapor phase, the patent eliminates the need for additional polycrystalline materials while maintaining seed crystal protection through controlled vapor deposition.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The seed crystal protects itself through the controlled vapor deposition process. The vapor phase synthesis naturally deposits material onto the seed crystal surface, providing self-protection without requiring external polycrystalline protective layers. The process parameters are controlled to ensure the seed crystal remains intact while enabling continuous growth.

Inventive Principle:
Principle #25Self-service

2Manufacturing precision

If volatile elements are used for synthesis, then high-purity semiconductor materials can be produced, but effective management and control of volatile elements during growth becomes difficult

Engineering Contradiction:
Improvematerial purityVSAvoidvolatile element control
Core Design Contradiction:
Manufacturing precisionVSEase of operation

Solution Approach 1:

The patent employs an inert atmosphere (argon or nitrogen) in the synthesis chamber to safely manage volatile elements. The inert gas environment prevents unwanted reactions of volatile elements with oxygen or moisture, allowing precise control of vapor phase synthesis while maintaining material purity and operational safety.

Inventive Principle:
Principle #39Inert atmosphere (Inert environment)

Solution Approach 2:

The invention replaces mechanical handling of volatile elements with vapor phase transport. Instead of directly manipulating volatile materials in solid or liquid form, the patent uses controlled vaporization and vapor-phase diffusion, allowing precise control through temperature and pressure parameters rather than mechanical operations.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Productivity

If continuous crystal growth is implemented, then production efficiency increases, but maintaining consistent quality and purity throughout the growth process becomes more challenging

Engineering Contradiction:
Improvecrystal growth efficiencyVSAvoidcrystal quality consistency
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent implements dynamic control of synthesis parameters during continuous crystal growth. Temperature, pressure, and vapor flow rates are continuously adjusted to maintain optimal conditions throughout the growth process, ensuring consistent crystal quality while enabling continuous production. The suspended seed crystal method allows for extended growth periods with stable parameter control.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The invention maintains continuous vapor phase deposition onto the suspended seed crystal, ensuring uninterrupted crystal growth. The continuous supply of volatile element vapor and controlled temperature gradient sustain steady-state growth conditions, producing high-purity crystals efficiently without periodic interruptions that could compromise quality consistency.

Inventive Principle:
Principle #20Continuity of useful action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables efficient in-situ synthesis and crystal growth of high-purity semiconductor materials by controlling temperature and pressure gradients, effectively isolating substances and protecting the seed crystal, resulting in improved purity and reduced costs.

Implementation Method 1

enabling firstly, the gasified volatile element to enter the synthesis unit from the growth unit

Methodology Applied
Scientific EffectCapillary action: Capillary Action

Implementation Method 2

heating the crystal growth unit to above the sublimation temperature of the volatile element

Methodology Applied
Scientific EffectSublimation: Sublimation

Implementation Method 3

Vertical Gradient Freeze (VGF) is one of the preferred methods for preparing low-defect crystals

Methodology Applied
Scientific EffectVertical Gradient Freeze: Freezing

Implementation Method 4

vacuumizing the furnace body to 10^-5 Pa

Methodology Applied
Scientific EffectVacuum: Vacuum

Data Source

PatentUS12188145B2Device and method for continuous VGF crystal growth through reverse injection synthesis
Publication Date: 2025.01.07 THE 13TH RES INST OF CHINA ELECTRONICS TECH GRP CORP
  • US12188145B2 patent drawing
  • US12188145B2 patent drawing
  • US12188145B2 patent drawing

AI summary

The invention discloses a device and a method for continuous VGF crystal growth through reverse injection synthesis, relating to a device for preparing a semiconductor crystal and growing a single crystal, in particular to a method and a device for continuously growing the crystal in situ by using a VGF method and reverse injection synthesis. The device includes a furnace body, a crucible, a heat preservation system, a heating system, a temperature control system and a gas pressure regulation system, wherein the crucible is arranged in the furnace body, has a synthesis unit at its upper part, and has a crystal growth unit and a seed crystal unit at its lower part, and the synthesis unit is communicated with the crystal growth unit through capillary pores.