VHM End Mill Coating via HIPIMS for Adhesion and Roughness

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing solid carbide milling cutters face challenges with coating adhesion, surface roughness, and wear resistance, particularly in face milling steel materials, where high adhesion and low surface roughness are crucial for extended tool life and performance.

Innovation Solution

A method involving a multi-layer coating applied using High Power Impulse Magnetron Sputtering (HIPIMS) with a functional layer of Ti x Al 1-x N and a cover layer of ZrN, where sputtering targets are subjected to power pulses exceeding 500 W/cm² and discharge current densities of ≥1 A/cm², resulting in high adhesion, low surface roughness, and enhanced wear resistance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If cathodic vacuum arc vapor deposition (Arc-PVD) is used to deposit coating, then deposition rate and layer adhesion are improved, but surface roughness increases due to macroparticle deposition

Engineering Contradiction:
Improvedeposition rateVSAvoidsurface roughness
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The harmful macroparticles (droplets) are extracted and removed from the deposition process by selecting an alternative PVD method (sputtering) that does not produce these particles, thereby eliminating the surface roughness problem while maintaining coating deposition

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The deposition parameters are changed by switching from arc-PVD to sputtering process, altering the physical mechanisms of material deposition to achieve both smooth surface and adequate deposition rate through process parameter optimization

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If cathode sputtering is used to deposit coating, then surface roughness is reduced, but deposition rate decreases resulting in longer process times

Engineering Contradiction:
Improvesurface roughnessVSAvoiddeposition rate
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The sputtering process uses pulsed power supply with periodic high current density pulses to enhance ionization of sputtered material, temporarily increasing deposition rate during pulse periods while maintaining smooth surface quality through controlled pulse duration and frequency

Inventive Principle:
Principle #19Periodic action

Solution Approach 2:

The sputtering parameters are optimized by applying high power density pulses (≥500 W/cm²) and high discharge current densities (≥1 A/cm²) to significantly increase deposition rate while maintaining the smooth surface characteristic of sputtered coatings

Inventive Principle:
Principle #35Parameter changes

3Reliability

If HIPIMS is used to deposit functional layer, then layer structure density and wear resistance are improved, but adhesion to substrate may be reduced

Engineering Contradiction:
Improvewear resistanceVSAvoidlayer adhesion
Core Design Contradiction:
ReliabilityVSStrength

Solution Approach 1:

The coating system uses different materials with specific properties for different layers: TiAlN functional layer for wear resistance and ZrN top layer for adhesion and low friction, with each layer optimized for its specific function to achieve both wear resistance and good adhesion

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The coating is designed as a composite multi-layer structure combining TiAlN and ZrN materials, where each material contributes its superior properties (wear resistance from TiAlN, adhesion and low friction from ZrN) to create a coating system that achieves both wear resistance and good adhesion

Inventive Principle:
Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method achieves a coated solid carbide milling cutter with improved adhesion, reduced surface roughness, and extended tool life by creating a coating with fine layer structures, high hardness, and low friction, leading to better machining performance and longer service life.

Implementation Method 1

high power impulse magnetron sputtering (HIPIMS)

Methodology Applied
Scientific EffectSputtering: Sputtering

Implementation Method 2

multi-layer coating applied by PVD process

Methodology Applied
Scientific EffectPhysical Vapour Deposition: Physical Vapour Deposition

Implementation Method 3

a large portion of the vaporized material is ionized and accelerated towards the substrate

Methodology Applied
Scientific EffectIonization: Ionisation

Implementation Method 4

high power impulse magnetron sputtering (HIPIMS)

Methodology Applied
Scientific EffectMagnetron sputtering:

Data Source

PatentEP3056587B1VHM end mill with TiAlN-ZrN coating
Publication Date: 2020.11.18 WALTER AG
  • EP3056587B1 patent drawingFigure 1

AI summary

Solid carbide end mills (VHM end mills) with a carbide substrate and a multilayer coating applied by PVD process to at least the surface areas that come into contact with a workpiece during the milling process, wherein the multilayer coating comprises a single or multilayer functional layer deposited directly on the substrate surface and a single or multilayer top layer deposited above it, wherein the functional layer consists of one or more layers of TixAl1-xN with 0.3 ≤ x ≤ 0.55 and has a total thickness of 1 µm to 15 µm, the top layer consists of one or more layers of ZrN and has a total thickness of 50 nm to 1 µm, and the functional layer and the top layer are deposited by means of high-power impulse magnetron sputtering (HI-PIMS), wherein during the deposition of the functional layer each sputtering target of material to be deposited in the coating chamber is subjected to power pulses.which transfer an amount of energy to the sputtering target that exceeds a maximum power density in the pulse of ≥ 500 W/cm2.