Via Light Blocking Layer for Array Substrate Reflection

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Solution Overview

Problem

Existing TFT-LCD array substrates suffer from exterior light reflection on pixel electrode layers via, which deteriorates the display effect by mixing reflected light with transmitted light.

Innovation Solution

A thin film transistor array substrate with a via penetrating the isolating layer, where the pixel electrode is electrically connected to the drain through the via, and a first light blocking layer is formed on the pixel electrode inside the via to prevent light reflection, along with a barrier layer to avoid residual light blocking material during manufacturing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a via is formed to electrically connect the drain with the pixel electrode, then electrical connectivity is achieved, but exterior light reflection occurs on the pixel electrode inside the via deteriorating display effect

Engineering Contradiction:
Improveelectrical connectivityVSAvoidlight reflection
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

A light blocking layer is introduced as an intermediary substance filling the via hole to block the harmful light reflection while maintaining electrical connectivity. The light blocking layer acts as a mediator that prevents exterior light from reflecting off the pixel electrode inside the via, thereby resolving the contradiction between achieving electrical connection and preventing light reflection.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The light blocking layer is applied locally only inside the via hole where the light reflection problem occurs, rather than covering the entire pixel electrode. This localized treatment blocks light reflection in the specific problematic area while maintaining the overall transparency and functionality of the pixel electrode structure.

Inventive Principle:
Principle #3Local quality

2Object-affected harmful factors

If a light blocking layer is formed on the pixel electrode inside the via, then light reflection is reduced, but manufacturing complexity increases

Engineering Contradiction:
Improvelight reflectionVSAvoidmanufacturing process
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The formation of the light blocking layer is merged with the via hole formation process. The light blocking layer is deposited as a continuous layer across the substrate, and the via holes are then etched through this layer along with the isolating layer, combining multiple manufacturing steps into a more integrated process that reduces overall complexity.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The light blocking layer is formed preliminarily before the via holes are etched. This preliminary action ensures that the light blocking material is already in place to prevent reflection, and the via etching process simultaneously removes both the isolating layer and allows access to the pixel electrode, streamlining the manufacturing sequence.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution effectively reduces light reflection, enhancing the display effect by improving light transmittance and preventing residual black matrix formation, thereby improving the overall performance of the display device.

Implementation Method 1

a first light blocking layer is formed on the pixel electrode inside the via to prevent light reflection

Methodology Applied
Scientific EffectLight blocking: Absorption (EM radiation)

Data Source

PatentUS9515028B2Array substrate, method of manufacturing the same and display device
Publication Date: 2016.12.06 BOE TECHNOLOGY GROUP CO LTD
  • US9515028B2 patent drawing
  • US9515028B2 patent drawing
  • US9515028B2 patent drawing

AI summary

An array substrate and manufacturing method thereof, and a display device are provided. The array substrate comprises a TFT, an isolating layer (M), a pixel electrode (12) and a via (Q) formed through the isolating layer (14). A drain (6) of the TFT is electrically connected with the pixel electrode (12) through the via (Q). A first light blocking layer (14a) is formed on the pixel electrode (12) inside the via (Q). In the array substrate of the present invention, display effect deterioration due to the light reflection on pixel electrode inside the via is avoided by forming the light blocking layer on the pixel electrode inside the via. At the same time, prior to manufacturing the light blocking layer, a barrier layer is formed first to guarantee no residual of light blocking layer will be left on the substrate, thereby improving display performance of the display device.