Vibration Element Torsional Beam Asymmetric Etching

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Solution Overview

Problem

Vibration elements used in optical scanners face challenges with beam damage due to large deflection angles, and existing strengthening structures are complex and not straightforward to implement.

Innovation Solution

A vibration unit is designed with a frame and a beam connecting the vibration element, where an etching process is applied to both surfaces of a substrate, with the meeting point of the etching processes positioned off-center, enhancing the mechanical strength of the torsional beam by reducing shear stress and preventing notch formation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If the deflection angle is increased to achieve higher resolution and faster scanning, then the vibration element's performance is improved, but the beam becomes easily damaged during vibration

Engineering Contradiction:
ImproveresolutionVSAvoidbeam durability
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The patent applies asymmetry by positioning the meeting point of the first and second etching processes at an off-center location relative to the beam's center position in the width direction. This asymmetric etching configuration creates a non-uniform stress distribution that prevents the formation of harmful notches at the beam's center, thereby improving beam durability while allowing large deflection angles for high-resolution scanning

Inventive Principle:
Principle #4Asymmetry

2Reliability

If the beam structure is strengthened to prevent damage, then beam durability is improved, but the structural complexity increases

Engineering Contradiction:
Improvebeam durabilityVSAvoidstructural complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent changes the geometric parameter of the beam by controlling the etching process to create a specific off-center meeting point configuration. This parameter change in the etching geometry inherently strengthens the beam by preventing notch formation, eliminating the need for additional complex strengthening structures while improving beam durability

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS8199389B2Vibration elements
Publication Date: 2012.06.12 RICOH CO LTD
  • US8199389B2 patent drawing
  • US8199389B2 patent drawing
  • US8199389B2 patent drawing

AI summary

A vibration unit including a frame, a vibration element including a substrate configured to vibrate, and a beam configured to connect the vibration element to the frame. The vibration unit is produced by applying an etching process to at least two surfaces of a substrate. A meeting position of the two surfaces of the substrate is located where a first etching process, which takes place on a first surface of the substrate and a second etching process, which takes place on a second surface of the substrate meet, and is located at a position other than a center position in a width direction of the beam.