Vibration Isolation Support for Large-Range Lithography Positioning
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Solution Overview
Problem
Conventional vibration isolation systems in lithographic apparatuses have limited range for position adjustments, requiring disassembly and reassembly of components, especially when adjustments need to be made in vacuum chambers, which is cumbersome and time-consuming.
Innovation Solution
A vibration isolation system with a support that includes a forward actuator and a return device, allowing the body engaging surface to move relative to the base in both directions, enabling larger positional adjustments without disassembly, by transitioning between coupled and uncoupled states to extend the range of movement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of time
If conventional vibration isolation systems are used with limited position adjustment range, then the system maintains simple structure and ease of operation, but larger positional adjustments require disassembly and reassembly which is time-consuming and reduces productivity
Solution Approach 1:
The support is designed to dynamically transition between coupled and uncoupled states. In the coupled state, the body engaging surface is fixed to the support for stable positioning. In the uncoupled state, the body engaging surface can be moved relative to the support to achieve larger position adjustments without disassembly. This dynamic reconfiguration allows the system to combine the stability of fixed mounting with the flexibility of adjustable positioning.
Solution Approach 2:
The support structure is segmented into movable and fixed portions. The body engaging surface is separated from the main support body, allowing independent movement of the engaging surface relative to the support. This segmentation enables the engaging surface to be repositioned along the direction of movement while the main support remains stable on the base.
2Adaptability or versatility
If the body engaging surface is fixed to the support, then the structure is simple and stable, but the range of position adjustment is limited
Solution Approach 1:
The support structure incorporates dynamic transition capability between coupled and uncoupled states. The body engaging surface can be coupled to the support for stable fixed positioning, or uncoupled to allow movement for position adjustment. This dynamic behavior enables the same structure to provide both stability and adaptability without requiring completely separate fixed and adjustable mechanisms.
3Reliability
If position sensitive elements are located deep inside the lithographic apparatus, then they are protected from external vibrations, but access for adjustment becomes difficult and time-consuming
Solution Approach 1:
The body engaging surface is designed to transition between coupled and uncoupled states relative to the support. When uncoupled, the body engaging surface can move along the direction of movement, allowing access and adjustment of position sensitive elements without requiring disassembly of the entire apparatus. When coupled, the elements are securely fixed for vibration-free operation during lithographic processes.
Data Source
AI summary
A vibration isolation system including a support, a forward actuator and a return device. The support is for supporting the body on a base. The support has a body engaging surface and a base engaging surface. The base engaging surface is arranged to couple to the base. The support couples the body engaging surface to the body in a coupled state. The support uncouples the body engaging surface from the body in an uncoupled state. The forward actuator moves the body and the body engaging surface together relatively to the base in a first direction from a first initial position to an end position in the coupled state. The return device is configured to move the body engaging surface relatively to the body opposite to the first direction from the end position to a second initial position in the uncoupled state.