Vinyl Ether Underlayer for Self-Assembly

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Solution Overview

Problem

Existing polymer compositions for underlayers in directed self-assembly of block copolymers are less effective in matching interaction properties with methyl methacrylate, particularly in providing thermally crosslinkable curing and suitable surface interaction characteristics.

Innovation Solution

A novel underlayer formulation comprising a polymer with pendant vinyl ether monomer units, a thermal acid generator, and a solvent, which can be used as either a pinning or neutral layer, to promote self-assembled structures through thermal curing and surface interaction optimization.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Stability of the object's composition

If epoxy-based monomers are used to provide crosslinked substrate, then thermal crosslinking is achieved, but surface interaction characteristics do not match methyl methacrylate

Engineering Contradiction:
Improvethermal crosslinking stabilityVSAvoidsurface interaction matching
Core Design Contradiction:
Stability of the object's compositionVSReliability

Solution Approach 1:

The patent changes the chemical composition parameters of the underlayer by using vinyl ether monomers with specific structural parameters (R groups and W divalent groups) instead of epoxy-based monomers. This parameter change enables both thermal crosslinking capability and improved surface interaction characteristics that match methyl methacrylate, resolving the contradiction between crosslinking stability and surface interaction reliability.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent creates a composite underlayer material comprising vinyl ether monomer repeat units combined with specific R groups (H, C1-C4 alkyl, or halogen) and W divalent groups (C1-C6 alkylene, C6-C20 arylene, benzylene, or C2-C20 alkyleneoxyalkylene). This composite structure integrates both the thermal crosslinking functionality and the surface interaction properties needed to match methyl methacrylate, simultaneously achieving both previously conflicting requirements.

Inventive Principle:
Principle #40Composite materials

2Stability of the object's composition

If crosslinked underlayer is formed to retard comingling, then underlayer stability is improved, but self-assembly guidance effectiveness is reduced

Engineering Contradiction:
Improveunderlayer stabilityVSAvoidself-assembly pattern precision
Core Design Contradiction:
Stability of the object's compositionVSManufacturing precision

Solution Approach 1:

The patent applies local quality by creating an underlayer with spatially differentiated properties: the vinyl ether monomer structure provides local regions with enhanced thermal crosslinking capability and stability, while simultaneously maintaining local surface interaction characteristics that match methyl methacrylate. This localized optimization enables the underlayer to provide both stability and precise self-assembly guidance without the trade-off present in uniform epoxy-based systems.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The formulation enables effective thermally crosslinkable curing and surface interaction characteristics similar to methyl methacrylate, enhancing the formation of self-assembled structures and pattern multiplication in block copolymer films.

Implementation Method 1

optional thermal acid generator

Methodology Applied
Scientific EffectThermal decomposition: Thermolysis

Implementation Method 2

thermally crosslinkable curing

Methodology Applied
Scientific EffectThermal crosslinking:

Data Source

PatentEP3049449B1Underlayer composition for promoting self assembly and method of making and using
Publication Date: 2019.01.09 AZ ELECTRONIC MATERIALS (LUXEMBOURG) SARL
  • EP3049449B1 patent drawingFigure 1~2
  • EP3049449B1 patent drawing
  • EP3049449B1 patent drawing

AI summary

Disclosed herein is a formulation for depositing a cured underlayer for promoting the formation of self assembled structures. The underlayer comprises: (a) a polymer comprising at least one pendant vinyl ether monomer repeat unit having the structure, (I): wherein R is chosen from H, C1-C4 alkyl, or halogen, and W is a divalent group chosen from C1-C6 alkylene, C6-C20 arylene, benzylene, or C2-C20 alkyleneoxyalkylene; (ii) optional thermal acid generator; and (c) a solvent. The invention also relates to processes of forming a pattern using the underlayer.