Virtual Job Coordination for Multi-Tool Substrate Processing
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Solution Overview
Problem
Existing substrate processing systems require multiple commands to control multiple processing apparatuses, increasing the load on operators and not being compliant with SEMI standards.
Innovation Solution
A substrate processing system that includes a first processing apparatus, a second processing apparatus, and an integrated control device, which generates virtual jobs to coordinate the processing of substrates across both apparatuses, allowing for centralized control and reduced operator load.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If multiple processing apparatuses are controlled by separate commands, then each apparatus can execute its processing independently, but the operator load increases and SEMI standards compliance is compromised
Solution Approach 1:
The patent introduces a substrate processing system that acts as an intermediary between the external control device and multiple processing apparatuses. The system receives a single control job from the external control device, automatically generates multiple separate commands for each processing apparatus, and coordinates their execution. This mediator approach reduces operator load by consolidating control while maintaining independent apparatus operation and ensuring SEMI standards compliance through standardized job formats.
Solution Approach 2:
The substrate processing system performs multiple functions: it receives control jobs from external control devices, generates appropriate commands for different types of processing apparatuses, coordinates substrate transport between apparatuses, and ensures SEMI standards compliance. This multi-functional approach allows a single system to manage diverse processing apparatuses without requiring separate control mechanisms for each.
2Ease of operation
If a single job command controls multiple processing apparatuses, then operator load is reduced, but SEMI standards compliance is violated
Solution Approach 1:
The patent segments the control job into multiple separate commands, with each command tailored for a specific processing apparatus. The system receives one overarching control job from the external control device, then automatically divides it into apparatus-specific commands that maintain SEMI standards compliance. This segmentation allows single-point control while preserving individual apparatus protocol requirements.
Solution Approach 2:
The control system dynamically adapts the control job format based on the specific processing apparatus being controlled. It transforms a standardized control job into multiple specialized commands, adjusting the command structure, content, and format according to each apparatus's requirements while maintaining overall coordination and SEMI standards compliance.
3Productivity
If batch processing apparatus executes chemical solution processing and rinse processing, then multiple substrates are processed simultaneously, but dry processing capability is lost
Solution Approach 1:
The patent combines batch processing apparatus and sheet-fed processing apparatus in a single substrate processing system. The batch processing apparatus handles chemical solution processing and rinse processing for multiple substrates simultaneously, while the sheet-fed processing apparatus handles dry processing for individual substrates. The system merges the capabilities of both apparatus types, allowing selective use of batch or sheet-fed processing modes depending on the required processing type.
Solution Approach 2:
The substrate processing system acts as an intermediary that coordinates between batch processing and sheet-fed processing apparatuses. It determines which apparatus should execute each processing step based on the required processing type, manages substrate transport between apparatuses, and ensures seamless integration of batch and sheet-fed processing workflows within a single control job.
Data Source
AI summary
A substrate processing system includes a first processing apparatus, a second processing apparatus, and an integrated control device. The first processing apparatus executes first processing on substrates in accordance with a job. The second processing apparatus executes second processing on substrates in accordance with a job. The integrated control device generates a first virtual job and a second virtual job in accordance with a command to create an integrated job, received from an external control device. The first processing apparatus executes at least part of the first processing on substrates in accordance with the first virtual job. The second processing apparatus executes, in accordance with the second virtual job, at least part of the second processing on the substrates that have been processed by the first processing apparatus.