Virtual Mask X-ray Diffractometer Resolution Adjustment
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Solution Overview
Problem
Conventional X-ray diffraction apparatuses require frequent and labor-intensive adjustments to change measurement resolution, often involving costly slit exchange or opening/closing mechanisms, and the installation of monochromator crystals shifts the incident X-ray position, necessitating additional mechanical adjustments.
Innovation Solution
The use of a two-dimensional detector with a virtual mask system that allows for adjustable opening dimensions and positions on a detection surface, enabling flexible measurement resolution changes without physical slits, and aligning with shifted X-ray positions without mechanical slit movement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the slit width of the rear light receiving slit is changed to adjust measurement resolution, then the measurement resolution is improved, but the device complexity and cost increase due to frequent manual slit exchange or opening/closing mechanisms
Solution Approach 1:
The patent uses a virtual mask that replicates the function of a physical slit without requiring mechanical components. The virtual mask is defined by software and can be adjusted by changing parameters in the control unit, eliminating the need for physical slit exchange or mechanical opening/closing mechanisms while maintaining the ability to control measurement resolution.
Solution Approach 2:
The patent replaces the mechanical slit adjustment system with a software-based virtual mask system. Instead of using physical slits that require manual exchange or mechanical actuators for opening/closing, the system uses digital parameter adjustment in the control unit to modify the virtual mask characteristics, thereby substituting mechanical complexity with software control.
2Measurement precision
If monochromator crystals are installed to improve measurement resolution, then the measurement resolution is improved, but the device complexity increases due to shifted incident X-ray positions requiring additional mechanical adjustments
Solution Approach 1:
The virtual mask system replicates the positional selection function without requiring physical realignment. When monochromator crystals are installed, the virtual mask parameters can be adjusted digitally to account for position shifts, eliminating the need for manual mechanical realignment operations.
Solution Approach 2:
The patent allows for parameter changes in the virtual mask definition to compensate for position shifts caused by monochromator crystal installation. The control unit can modify the virtual mask parameters (such as position coordinates or acceptance angles) to maintain proper alignment without requiring physical adjustment of mechanical components.
3Measurement precision
If a rear light receiving slit is used to limit X-ray dose, then the measurement resolution is controlled, but the loss of time increases due to frequent slit exchange or mechanical adjustment operations
Solution Approach 1:
The virtual mask system eliminates the need for physical slit exchange operations. By using a software-defined mask that can be reconfigured through parameter changes in the control unit, the system avoids the time-consuming process of manually exchanging physical slits or mechanically adjusting slit widths.
Solution Approach 2:
The patent substitutes the mechanical slit adjustment process with a software-based parameter modification process. The control unit can instantly change virtual mask parameters without any mechanical movement or physical component exchange, thereby eliminating the time loss associated with manual slit adjustment operations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for flexible and cost-effective adjustment of measurement resolution in both directions, eliminating the need for physical slits and mechanical adjustments, reducing the apparatus's cost and operational complexity while maintaining high measurement accuracy.
Implementation Method 1
an X-ray diffraction apparatus for irradiating a sample with X-rays and detecting the X-rays diffracted by the sample
Data Source
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AI summary
There is provided an X-ray diffraction apparatus configured to irradiate a sample S on a sample stand with X-rays generated from an X-ray source and detect the X-rays diffracted by a sample using a detector, including a virtual mask setting section and a signal processing section. The detector outputs detection signals according to intensity of the X-rays received by detection elements, for each of the plurality of detection elements forming a detection surface. The virtual mask setting section is capable of setting a virtual mask on the detection surface of the detector, and setting at least an opening dimension of the virtual mask as an opening condition of the virtual mask independently in an X direction and a Y direction. The signal processing section processes the detection signals outputted from the detector according to the opening condition of the virtual mask set in the virtual mask setting section.