Virtual Sensors for Semiconductor Chamber Drift
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Solution Overview
Problem
Semiconductor wafer processing faces challenges due to chamber drift caused by erosion and degradation of components, leading to non-uniform outcomes and the need for frequent recalibration, as existing control loop sensors are not infallible and lack data for optimizing process conditions.
Innovation Solution
The implementation of a semiconductor processing tool with control loop sensors and witness sensors, along with a data model that generates virtual sensor data to detect chamber drift and adjust process inputs, utilizing a statistical and physical model to maintain a desired process window.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If control loop sensors are used to monitor chamber conditions, then process control is improved, but sensor degradation and chamber drift still occur leading to non-uniform outcomes
Solution Approach 1:
The patent creates virtual copies of physical sensors through data models that simulate sensor behavior. These virtual sensors are instantiated from sensor definitions and can be updated with calibration data to maintain accuracy even when physical sensors drift. The virtual sensor system replicates the functionality of physical sensors while being programmatically adjustable.
Solution Approach 2:
The patent implements feedback mechanisms where virtual sensor data is compared against target values, and control actions are automatically adjusted to maintain process parameters within specification. The system continuously monitors virtual sensor readings and makes real-time corrections to compensate for chamber drift and physical sensor degradation.
2Measurement precision
If physical sensors are degraded or eroded, then measurement accuracy decreases, but recalibration requires downtime and reduces productivity
Solution Approach 1:
The patent creates virtual copies of physical sensors through data models that simulate sensor behavior. These virtual sensors are instantiated from sensor definitions and can be updated with calibration data to maintain accuracy even when physical sensors drift. The virtual sensor system replicates the functionality of physical sensors while being programmatically adjustable.
Solution Approach 2:
The patent allows dynamic modification of sensor parameters including calibration offsets, scaling factors, and response characteristics. These parameter changes can be applied to virtual sensors without physical intervention, enabling continuous operation while maintaining measurement accuracy through software-based recalibration.
3Measurement precision
If multiple sensors and data models are implemented, then chamber drift detection is improved, but system complexity increases
Solution Approach 1:
The patent segments the sensing system into distinct components: physical sensors, sensor definitions, virtual sensor instantiations, data models, and control logic. This modular architecture allows each component to be developed, calibrated, and maintained independently, reducing overall system complexity despite the multiple layers of abstraction.
Solution Approach 2:
The patent introduces virtual sensors as intermediary entities between physical sensors and control logic. These virtual sensors act as mediators that can process, filter, and transform raw sensor data before passing it to control algorithms, simplifying the interface between physical measurement and control decision-making.
4Productivity
If virtual sensor data is used to control the physical tool, then process optimization is improved, but data model accuracy requirements increase
Solution Approach 1:
The patent creates virtual copies of physical sensors through data models that simulate sensor behavior. These virtual sensors are instantiated from sensor definitions and can be updated with calibration data to maintain accuracy even when physical sensors drift. The virtual sensor system replicates the functionality of physical sensors while being programmatically adjustable.
Solution Approach 2:
The patent implements feedback mechanisms where virtual sensor data is compared against target values, and control actions are automatically adjusted to maintain process parameters within specification. The system continuously monitors virtual sensor readings and makes real-time corrections to compensate for chamber drift and physical sensor degradation.
Data Source
AI summary
Embodiments disclosed herein include a processing tool and methods of using the processing tool. In an embodiment, the processing tool comprises a chamber, and a cartridge for flowing one or more processing gasses into the chamber from a plurality of gas sources. In an embodiment, the processing tool further comprises a mass flow controller for each of the plurality of gas sources, and a mass flow meter between the gas sources and the cartridge. In an embodiment, the processing tool further comprises a first pressure gauge between the mass flow meter and the cartridge, a second pressure gauge fluidically coupled to the chamber, and an exhaust line coupled to the chamber.